COMPOSITION COMPRISING AN AMMONIA-ACTIVATED SILOXANE FOR AVOIDING PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW
Loeffler, Daniel, Klipp, Andreas, Wei, Sheng Hsuan, Heine, Niklas Benjamin, Brill, Marcel, Kao, Chi Yueh, Shen, Mei Chin, Csihony, Szilard, Pirrung, Frank
Year of Publication 02.06.2022
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Year of Publication 02.06.2022
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COMPOSITION COMPRISING AN AMMONIA-ACTIVATED SILOXANE FOR AVOIDING PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW
SHEN, Mei Chin, PIRRUNG, Frank, LOEFFLER, Daniel, HEINE, Niklas Benjamin, KAO, Chi Yueh, CSIHONY, Szilard, WEI, Sheng Hsuan, KLIPP, Andreas, BRILL, Marcel
Year of Publication 16.02.2022
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Year of Publication 16.02.2022
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COMPOSITION COMPRISING AN AMMONIA-ACTIVATED SILOXANE FOR AVOIDING PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW
SHEN, Mei Chin, PIRRUNG, Frank, LOEFFLER, Daniel, HEINE, Niklas Benjamin, KAO, Chi Yueh, CSIHONY, Szilard, WEI, Sheng Hsuan, KLIPP, Andreas, BRILL, Marcel
Year of Publication 15.10.2020
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Year of Publication 15.10.2020
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Use of a composition consisting of ammonia and an alkanol for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below
GUEVENC, HACI OSMAN, KLIPP, ANDREAS, LOEFFLER, DANIEL, KAO, CHI-YUEH, SHEN, MARY MA-LI
Year of Publication 01.12.2021
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Year of Publication 01.12.2021
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COMPOSITION COMPRISING AN AMMONIA-ACTIVATED SILOXANE FOR AVOIDING PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW
HEINE NIKLAS BENJAMIN, SHEN MEI CHIN, WEI SHENG HSUAN, BRILL MARCEL, CSIHONY SZILARD, KAO CHI YUEH, LOEFFLER DANIEL, KLIPP ANDREAS, PIRRUNG FRANK
Year of Publication 26.11.2021
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Year of Publication 26.11.2021
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Composition comprising an ammonia-activated siloxane for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below
CSIHONY, SZILARD, SHEN, MEIIN, WEI, SHENG-HSUAN, BRILL, MARCEL, KLIPP, ANDREAS, HEINE, NIKLAS BENJAMIN, LOEFFLER, DANIEL, PIRRUNG, FRANK, KAO, CHI-YUEH
Year of Publication 01.02.2021
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Year of Publication 01.02.2021
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