Search Results - "KANG, Wen-Bing" :: K.UTB vyhledávací portál

A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN COMPRISING A LACTAM

by DAMMEL RALPH R, KANG WEN BING, THIYAGARAJAN MUTHIAH, CAO YI, HONG, SUNG EUN, ANYADIEGWU CLEMENT
Year of Publication 10.02.2010

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Method for forming resist pattern

by KANG WEN-BING, KIMURA KEN, MATSUO SHOKO
Year of Publication 21.03.2001

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Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefrom

by KANG WEN-BING, KIMURA KEN, MATSUO SHOKO
Year of Publication 15.11.2000

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Composition for bottom reflection preventive film and novel polymeric dye for use in the same

by KANG WEN-BING, GEORG PAWLOWSKI, TANAKA HATSUYUKI
Year of Publication 15.11.2000

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Light-absorbing polymers and application thereof to antireflection film

by KANG WEN-BING, KIMURA KEN, NISHIWAKI YOSHINORI
Year of Publication 28.06.2000

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Water-soluble resin composition for the formation of micropatterns and process for the formation of micropatterns with the same

by KANG WEN-BING, HONG SUNG-EUN, TAKANO YUSUKE
Year of Publication 18.07.2012

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Light-absorbing polymer, composition forming light-absorbing coating, light-absorbing coatings, and antireflection coating made by using same

by KANG WEN-BING, PADMANABAN MUNIRATHNA, TANAKA HATSUYUKI
Year of Publication 08.09.1999

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Composition for antireflection or light absorption film and compounds for use in the same

by KANG WEN-BING, M. PADMANABAN, TANAKA HATSUYUKI
Year of Publication 25.08.1999

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LICHTABSORBIERENDES POLYMER, VERFAHREN ZU DESSEN SYNTHESE UND FILMBILDENDE ZUSAMMENSETZUNG UND ANTIREFLEKTIONSFILM DER UNTER VERWENDUNG DIESES POLYMERS HERGESTELLT WIRD

by ARAMAKI, KAYO, TANAKA, HATSUYUKI, KIMURA, KEN, TOKIDA, AKIHIKO, KANG, WEN-BING
Year of Publication 03.05.2007

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Light-absorbing polymer, method for synthesizing thereof and film-forming composition and antireflection film prepared using said polymer

by KANG WEN-BING, ARAMAKI KAYO, TOKIDA AKIHIKO
Year of Publication 13.01.1999

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POLYMER USEFUL FOR PREPARING ANTI-REFLECTIVE COATING OR LIGHT ABSORPTION COATING

by KANG WEN-BING, PAWLOWSKI GEORG, PADMANABAN MUNIRATHNA, TANAKA HATSUYUKI, KIMURA TAKESHI
Year of Publication 09.11.2006

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POLYMER USEFUL FOR FORMING ANTI-REFLECTIVE FILM AND LIGHT ABSORBING FILM

by KANG WEN-BING, PAWLOWSKI GEORG, PADMANABAN MUNIRATHNA, TANAKA HATSUYUKI, KIMURA TAKESHI
Year of Publication 26.10.2006

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LIGHT-ABSORBING POLYMERS AND APPLICATION THEREOF TO ANTIREFLECTION FILM

by NISHIWAKI, YOSHINORI, MATSUO, SHOKO, TANAKA, HATSUYUKI, KIMURA, KEN, KANG, WEN-BING
Year of Publication 09.08.2006

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ZUSAMMENSETZUNG ZUR AUSBILDUNG EINES LICHTABSORBIERENDEN FILMS ENTHALTEND BLOCKIERTE ISOCYANATVERBINDUNGEN UND EIN DARAUS GEBILDETER ANTIREFLEKTIVER FILM

by NISHIWAKI, YOSHINORI, MATSUO, SHOKO, TANAKA, HATSUYUKI, KIMURA, KEN, KANG, WEN-BING
Year of Publication 03.08.2006

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LIGHT-ABSORBING POLYMER, METHOD FOR SYNTHESIZING THE SAME, AND FILM-FORMING COMPOSITION AND ANTIREFLECTION FILM PREPARED USING SAID POLYMER

by ARAMAKI, KAYO, TANAKA, HATSUYUKI, KIMURA, KEN, TOKIDA, AKIHIKO, KANG, WEN-BING
Year of Publication 21.06.2006

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USE OF A COMPOSITION FOR BOTTOM REFLECTION PREVENTIVE FILM

by NISHIWAKI, YOSHINORI, PAWLOWSKI, GEORG, TANAKA, HATSUYUKI, KIMURA, KEN, PADMANABAN, MUNIRATHNA, KANG, WEN-BING
Year of Publication 12.04.2006

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COMPOSITION FOR LIGHT ABSORPTION FILM FORMATION CONTAINING BLOCKED ISOCYANATE COMPOUND AND ANTIREFLECTION FILM FORMED THEREFROM

by NISHIWAKI, YOSHINORI, MATSUO, SHOKO, TANAKA, HATSUYUKI, KIMURA, KEN, KANG, WEN-BING
Year of Publication 09.11.2005

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Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefrom

by Kang, Wen-Bing, Kimura, Ken, Matsuo, Shoko, Nishiwaki, Yoshinori, Tanaka, Hatsuyuki
Year of Publication 06.09.2005

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Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefrom

by KANG WEN-BING, KIMURA KEN, NISHIWAKI YOSHINORI, MATSUO SHOKO, TANAKA HATSUYUKI
Year of Publication 06.09.2005

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Method for producing a resist pattern

by MATSUURA, YURIKO, WANG, XIAO-WEI, KANG, WEN-BING
Year of Publication 16.08.2010

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