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"KANDABARA N TAPILY"
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"KANDABARA N TAPILY"
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ATOMIC LAYER DEPOSITION OF ALUMINUM OXIDE FILMS FOR SEMICONDUCTOR DEVICES USING AN ALUMINUM ALKOXIDE OXIDIZER
by
Tapily
,
Kandabara N
Year of Publication
29.09.2022
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Method of selectively forming metal silicides for semiconductor devices
by
Tapily
,
Kandabara N
Year of Publication
13.09.2022
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METHOD FOR REDUCING LATERAL FILM FORMATION IN AREA SELECTIVE DEPOSITION
by
Tapily
,
Kandabara N
Year of Publication
23.12.2021
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HIGH-THROUGHPUT MULTI-STAGE MANUFACTURING PLATFORM AND METHOD FOR PROCESSING A PLURALITY OF SUBSTRATES
by
Tapily
,
Kandabara N
Year of Publication
01.07.2021
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METHOD FOR MITIGATING LATERIAL FILM GROWTH IN AREA SELECTIVE DEPOSITION
by
Tapily
,
Kandabara N
Year of Publication
21.01.2021
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METHOD OF SELECTIVELY FORMING METAL SILICIDES FOR SEMICONDUCTOR DEVICES
by
Tapily
,
Kandabara N
Year of Publication
24.09.2020
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Method and apparatus for selective film deposition using a cyclic treatment
by
Tapily
,
Kandabara N
Year of Publication
03.03.2020
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Method for preferential oxidation of silicon in substrates containing silicon and germanium
by
Tapily
,
Kandabara N
Year of Publication
03.03.2020
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In-situ selective deposition and etching for advanced patterning applications
by
Tapily
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Kandabara N
Year of Publication
07.01.2020
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Method of filling retrograde recessed features with no voids
by
Tapily
,
Kandabara N
Year of Publication
22.10.2019
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Selective film formation for raised and recessed features using deposition and etching processes
by
Tapily
,
Kandabara N
Year of Publication
13.08.2019
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DUAL METAL WRAP-AROUND CONTACTS FOR SEMICONDUCTOR DEVICES
by
Tapily
,
Kandabara N
,
Niimi, Hiroaki
,
Hakamata, Takahiro
Year of Publication
29.09.2022
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Method of selectively forming metal silicides for semiconductor devices
by
TAPILY
,
KANDABARA N
Year of Publication
11.03.2024
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SELECTIVE FILM FORMATION FOR RAISED AND RECESSED FEATURES USING DEPOSITION AND ETCHING PROCESSES
by
Tapily
,
Kandabara N
Year of Publication
14.03.2019
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Dual metal wrap-around contacts for semiconductor devices
by
Tapily
,
Kandabara N
,
Niimi, Hiroaki
,
Hakamata, Takahiro
Year of Publication
28.06.2022
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IN-SITU SELECTIVE DEPOSITION AND ETCHING FOR ADVANCED PATTERNING APPLICATIONS
by
TAPILY
,
Kandabara N
Year of Publication
22.11.2018
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IN-SITU SELECTIVE DEPOSITION AND ETCHING FOR ADVANCED PATTERNING APPLICATIONS
by
Tapily
,
Kandabara N
Year of Publication
15.11.2018
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Selective film formation for raised and recessed features using deposition and etching processes
by
Tapily
,
Kandabara N
Year of Publication
30.10.2018
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METHOD OF FILLING RETROGRADE RECESSED FEATURES WITH NO VOIDS
by
Tapily
,
Kandabara N
Year of Publication
11.10.2018
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Method of selective deposition for forming fully self-aligned vias
by
TAPILY
,
KANDABARA N
Year of Publication
16.07.2023
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