Newly developed acrylic copolymers for ArF photoresist
Kamon, Yoshihiro, Momose, Hikaru, Kuwano, Hideaki, Fujiwara, Tadayuki, Fujimoto, Masaharu
Published in Journal of Photopolymer Science and Technology (01.01.2002)
Published in Journal of Photopolymer Science and Technology (01.01.2002)
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Journal Article
POLYESTER RESIN
ASAI GAKUBUN, KAMON YOSHIHIRO, KONDO AKISHI, OZAWA TADAHIRO, TACHIBANA YUKA
Year of Publication 17.10.2019
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Year of Publication 17.10.2019
Patent