Formation of Vinylidenes from Internal Alkynes at a Cyclotriphosphato Ruthenium Complex
Ikeda, Yousuke, Yamaguchi, Takafumi, Kanao, Keiichiro, Kimura, Kazuhiro, Kamimura, Sou, Mutoh, Yuichiro, Tanabe, Yoshiaki, Ishii, Youichi
Published in Journal of the American Chemical Society (17.12.2008)
Published in Journal of the American Chemical Society (17.12.2008)
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Journal Article
Materials and Processes of Negative Tone Development for Double Patterning Process
Tarutani, Shinji, Tsubaki, Hideaki, Kamimura, Sou
Published in Journal of Photopolymer Science and Technology (01.01.2009)
Published in Journal of Photopolymer Science and Technology (01.01.2009)
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Journal Article
Reduction of the Outgassing Segments and LWR Improvement for the Next Generation EUV Lithography
Masuda, Seiya, Tarutani, Shinji, Kamimura, Sou, Hirano, Shuuji, Hoshino, Wataru, Mizutani, Kazuyoshi
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
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Journal Article
Synthesis and Characterization of Cyclotetraphosphato Complexes of Rh(I), Ir(I), Ru(II), and Pd(II)
Kamimura, Sou, Kuwata, Shigeki, Iwasaki, Masakazu, Ishii, Youichi
Published in Inorganic chemistry (26.01.2004)
Published in Inorganic chemistry (26.01.2004)
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Journal Article
Reduction of the Outgassing Segment in Acetal based Chemically Amplified Resist for EUV Lithography
Masuda, Seiya, Kawanishi, Yasutomo, Hirano, Shuuji, Kamimura, Sou, Mizutani, Kazuyoshi, Shitabatake, Koji
Published in Journal of Photopolymer Science and Technology (01.01.2006)
Published in Journal of Photopolymer Science and Technology (01.01.2006)
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Journal Article
Transformations of Alkynes at a Cyclotriphosphato Ruthenium Complex
Kanao, Keiichiro, Ikeda, Yousuke, Kimura, Kazuhiro, Kamimura, Sou, Tanabe, Yoshiaki, Mutoh, Yuichiro, Iwasaki, Masakazu, Ishii, Youichi
Published in Organometallics (28.01.2013)
Published in Organometallics (28.01.2013)
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Journal Article
PATTERN FORMING METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT USED IN SAME, METHOD FOR PRODUCING ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
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Patent
PATTERN FORMING METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT USED IN SAME, METHOD FOR PRODUCING ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
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