The effect of dose rate on ion implanted impurity profiles in silicon
Tian, S., Yang, S.-H., Morris, S., Parab, K., Tasch, A.F., Kamenitsa, D., Reece, R., Freer, B., Simonton, R.B., Magee, C.
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.05.1996)
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.05.1996)
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Journal Article
An examination of the effect of dose rate on ion implanted impurity profiles in silicon
TIAN, S, YANG, S.-H, MORRIS, S, PARAB, K, TASCH, A. F, KAMENITSA, D, REECE, R, FREER, B, SIMONTON, R. B, MAGEE, C
Published in Journal of the Electrochemical Society (01.09.1995)
Published in Journal of the Electrochemical Society (01.09.1995)
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Journal Article
Channeling effects of silicon implantation into large-diameter gallium arsenide substrates
SIMONTON, R. B, ROSENBLATT, D. H, CORCORAN, E, KAMENITSA, D
Published in Journal of applied physics (01.03.1992)
Published in Journal of applied physics (01.03.1992)
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Journal Article
Therma-wave dose sensitivity considerations, including energy dependence
Kamenitsa, D., Lillian, P., Luckman, G., Becker, K., Colvin, N., Rendon, M., Bokharey, Z.
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)
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Conference Proceeding
Use of the temperature dependence of the therma-wave technique as a thermometer
Rathmell, Robert D., Kamenitsa, Dennis, Brubaker, Steve, Reece, Ron, Pearce, N.O.
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.05.1995)
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.05.1995)
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Journal Article
An accurate and computationally efficient semi-empirical model for arsenic implants into single-crystal (100) silicon
SHYH-HORNG YANG, MORRIS, S. J, LIM, D. L, TASCH, A. F, SIMONTON, R. B, KAMENITSA, D, MAGEE, C, LUX, G
Published in Journal of electronic materials (01.08.1994)
Published in Journal of electronic materials (01.08.1994)
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Journal Article
Reducing arsenic to germanium cross contamination with isotopically enriched SDS /sup 72/GeF/sub 4
Rendon, M.J., Locke, J., Brown, B., Kamenitsa, D.
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)
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Conference Proceeding
Monte Carlo simulation of heavy species (Indium and Germanium) ion implantation into silicon
Chen, Y., Obradovic, B., Morris, M., Wang, G., Balamurugan, G., Li, D., Tasch, A. F., Kamenitsa, D., McCoy, W., Baumann, S., Bleier, R., Sieloff, D., Dyer, D., Zeitzoff, P.
Published in Journal of technology computer aided design (1996)
Published in Journal of technology computer aided design (1996)
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Journal Article
An accurate and computationally efficient model for phosphorus implants into (100) single-crystal silicon
Morris, S., Ghante, V., Lam, L.M., Yang, S.-H., Morris, M., Tasch, A.F., Kamenitsa, D., Sheng, J., Magee, C.
Published in Proceedings of 11th International Conference on Ion Implantation Technology (1996)
Published in Proceedings of 11th International Conference on Ion Implantation Technology (1996)
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Conference Proceeding
Detailed analysis and computationally efficient modeling of ultra-shallow as-implanted profiles obtained by low energy B, BF/sub 2/, and As ion implantation
Parab, K.B., Morris, M.F., Yang, S.-H., Morris, S.J., Tian, S., Obradovic, B., Tasch, A.F., Kamenitsa, D., Simonton, R., Magee, C.
Published in Proceedings of 11th International Conference on Ion Implantation Technology (1996)
Published in Proceedings of 11th International Conference on Ion Implantation Technology (1996)
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Conference Proceeding