Chromatin accessibility profiling in Neurospora crassa reveals molecular features associated with accessible and inaccessible chromatin
Ferraro, Aileen R, Ameri, Abigail J, Lu, Zefu, Kamei, Masayuki, Schmitz, Robert J, Lewis, Zachary A
Published in BMC genomics (19.06.2021)
Published in BMC genomics (19.06.2021)
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Journal Article
Phenotypic abnormalities of fr, sp, and och-1 single mutants are suppressed by loss of putative GPI-phospholipase A2 in Neurospora crassa
Kamei, Masayuki, Tsukagoshi, Yuko, Banno, Shinpei, Ichiishi, Akihiko, Fukumori, Fumiyasu, Fujimura, Makoto
Published in Mycoscience (01.05.2017)
Published in Mycoscience (01.05.2017)
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Journal Article
Histone H1 Limits DNA Methylation in Neurospora crassa
Seymour, Michael, Ji, Lexiang, Santos, Alex M, Kamei, Masayuki, Sasaki, Takahiko, Basenko, Evelina Y, Schmitz, Robert J, Zhang, Xiaoyu, Lewis, Zachary A
Published in G3 : genes - genomes - genetics (01.07.2016)
Published in G3 : genes - genomes - genetics (01.07.2016)
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Journal Article
Estimation of defect generation probability in thin Si surface damaged layer during plasma processing
Eriguchi, Koji, Ohno, Akira, Hamada, Daisuke, Kamei, Masayuki, Ono, Kouichi
Published in Thin solid films (01.08.2008)
Published in Thin solid films (01.08.2008)
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Journal Article
Threshold Voltage Instability Induced by Plasma Process Damage in Advanced Metal--Oxide--Semiconductor Field-Effect Transistors
Eriguchi, Koji, Nakakubo, Yoshinori, Matsuda, Asahiko, Kamei, Masayuki, Takao, Yoshinori, Ono, Kouichi
Published in Japanese Journal of Applied Physics (01.08.2010)
Published in Japanese Journal of Applied Physics (01.08.2010)
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Journal Article
(Invited) Characterization of Oxide Traps Participating in Random Telegraph Noise Using Charging History Effects in Nano-Scaled MOSFETs
Tsuchiya, Toshiaki, Tamura, Naoyoshi, Sakakidani, Akihito, Sonoda, Kenichiro, Kamei, Masayuki, Yamakawa, Shinya, Kuwabara, Sumio
Published in ECS transactions (31.08.2013)
Published in ECS transactions (31.08.2013)
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Journal Article
Random telegraph noise as a new measure of plasma-induced charging damage in MOSFETs
Kamei, Masayuki, Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi
Published in 2014 IEEE International Conference on IC Design & Technology (01.05.2014)
Published in 2014 IEEE International Conference on IC Design & Technology (01.05.2014)
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Conference Proceeding
Strain-induced charge separation in the photocatalytic single crystalline anatase TiO2 film
Kamei, Masayuki, Miyagi, Takahira, Ishigaki, Takamasa
Published in Chemical physics letters (17.05.2005)
Published in Chemical physics letters (17.05.2005)
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Journal Article
Comprehensive Modeling of Threshold Voltage Variability Induced by Plasma Damage in Advanced Metal--Oxide--Semiconductor Field-Effect Transistors
Eriguchi, Koji, Nakakubo, Yoshinori, Matsuda, Asahiko, Kamei, Masayuki, Takao, Yoshinori, Ono, Kouichi
Published in Japanese Journal of Applied Physics (01.04.2010)
Published in Japanese Journal of Applied Physics (01.04.2010)
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Journal Article