The new dry method of mask (relief) formation by direct electron-beam etching of resist
Bruk, M.A., Zhikharev, E.N., Streltsov, D.R., Kalnov, V.A., Spirin, A.V.
Published in Microelectronic engineering (01.12.2013)
Published in Microelectronic engineering (01.12.2013)
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Journal Article
METHOD OF APPLYING HIGH-RESOLUTION IMAGE OF FUNCTIONAL LAYERS BASED ON THIN POLYMER FILMS ON THE SURFACE OF SOLIDS
BUZIN A.I, BRUK M.A, SPIRIN A.V, KARDASH I.E, KAL'NOV V.A, ZHIKHAREV E.N
Year of Publication 27.02.2005
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Year of Publication 27.02.2005
Patent
METHOD OF APPLYING THIN POLYMER LAYERS ON SURFACE OF SOLIDS
BRUK M.A, SPIRIN A.V, KARDASH I.E, TELESHOV EH.N, KAL'NOV V.A, ZHIKHAREV E.N
Year of Publication 10.10.2002
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Year of Publication 10.10.2002
Patent