Ion projection lithography: status of tool and mask developments
Kaesmaier, Rainer, Ehrmann, Albrecht, Löschner, Hans
Published in Microelectronic engineering (01.09.2001)
Published in Microelectronic engineering (01.09.2001)
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Journal Article
Conference Proceeding
Ion Projection Lithography: Progress of European MEDEA & International Program
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Journal Article
Conference Proceeding
Photolithographic process and mask therefor
WIDMANN, DIETRICH, FRIEDRICH, CHRISTOPH, FUELBER, CARSTEN, KAESMAIER, RAINER, CZECH, GUENTHER
Year of Publication 09.06.2004
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Year of Publication 09.06.2004
Patent
Lithography method and lithography mask
KAESMAIER RAINER, FRIEDRICH CHRISTOPH, WIDMANN DIETRICH, CZECH GUENTHER, FUELBER CARSTEN
Year of Publication 03.02.2004
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Year of Publication 03.02.2004
Patent
Photolithographic process and mask therefor
WIDMANN, DIETRICH, FRIEDRICH, CHRISTOPH, FUELBER, CARSTEN, KAESMAIER, RAINER, CZECH, GUENTHER
Year of Publication 10.07.2002
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Year of Publication 10.07.2002
Patent
Lithographic process for structuring layers during the manufacture of integrated circuits comprises guiding radiation emitted by a radiation source and lying in the extreme UV range onto photosensitive layers via a mask
WIDMANN, DIETRICH, FRIEDRICH, CHRISTOPH, FUELBER, CARSTEN, KAESMAIER, RAINER, CZECH, GUENTHER
Year of Publication 21.06.2001
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Year of Publication 21.06.2001
Patent
Lithograph method and mask to its application
FUELBER, CARSTEN DR, WIDMANN, DIETRICH, FRIEDRICH, CHRISTOPH, KAESMAIER, RAINER, CZECH, GUENTHER
Year of Publication 21.03.2002
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Year of Publication 21.03.2002
Patent
Photolithographic process and mask therefor
WIDMANN, DIETRICH, FRIEDRICH, CHRISTOPH, FUELBER, CARSTEN, KAESMAIER, RAINER, CZECH, GUENTHER
Year of Publication 18.07.2001
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Year of Publication 18.07.2001
Patent