Mass spectrometry detection of radicals in SiH 4 -CH 4 -H 2 glow discharge plasmas
Kae-Nune, P, Perrin, J, Guillon, J, Jolly, J
Published in Plasma sources science & technology (01.05.1995)
Published in Plasma sources science & technology (01.05.1995)
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Journal Article
Mass spectrometry detection of radicals in SiH4-CH4-H2 glow discharge plasmas
Kae-Nune, P, Perrin, J, Guillon, J, Jolly, J
Published in Plasma sources science & technology (01.05.1995)
Published in Plasma sources science & technology (01.05.1995)
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Journal Article
Strain relaxation of Ga/sub 0.2/In/sub 0.8/As and InAs/sub 0.5/P/sub 0.5/ layers grown on InP substrate for 1.6 to 2.4 /spl mu/m spectral range Ga/sub x/In/sub 1-x/As/InAs/sub y/P/sub 1-y//InP photodiodes application
Kae-Nune, P., di Forte-Poisson, M.A., Brylinski, C., di Persio, J.
Published in 1993 (5th) International Conference on Indium Phosphide and Related Materials (1993)
Published in 1993 (5th) International Conference on Indium Phosphide and Related Materials (1993)
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Conference Proceeding