2-in-1 total process integration in MERIE etch chamber for Cu dual damascene applications
Wu, R., Zhang, L., Yang, J., Tsui, J., Jiang, A., Sun, J., Yuan, J., Hsieh, P., Hung, R., Ye, Y., Hsueh, G., Jyu-Horng Shieh, Jen-Cheng Liu, Chia-Shueng Tsai
Published in 2000 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 2000 (Cat. No.00CH37072) (2000)
Published in 2000 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 2000 (Cat. No.00CH37072) (2000)
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Conference Proceeding
20nm gate bulk-finFET SONOS flash
Jiunn-Ren Hwang, Tsung-Lin Lee, Huan-Chi Ma, Tzyh-Cheang Lee, Tang-Hsuan Chung, Chang-Yun Chang, Sheng-Da Liu, Baw-Ching Perng, Ju-Wang Hsu, Ming-Yong Lee, Chih-Yuan Ting, Chien-Chao Huang, Ji-Hua Wang, Jyu-Horng Shieh, Fu-Liang Yang
Published in IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest (2005)
Published in IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest (2005)
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