Pulsed laser deposition of ZnO thin films for applications of light emission
Bae, Sang Hyuck, Lee, Sang Yeol, Jun Jin, Beom, Im, Seongil
Published in Applied surface science (01.02.2000)
Published in Applied surface science (01.02.2000)
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Journal Article
Effects of Post-Deposition Annealing on the Electrical Properties of HfSiO Films Grown by Atomic Layer Deposition
Cho, Hag-Ju, Lee, Hye Lan, Park, Hong Bae, Jeon, Taek Soo, Park, Seong Geon, Jin, Beom Jun, Kang, Sang Bom, Shin, Yu Gyun, Chung, U-In, Moon, Joo Tae
Published in Japanese Journal of Applied Physics (01.04.2005)
Published in Japanese Journal of Applied Physics (01.04.2005)
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Journal Article
Qualification method for DRAM retention by leakage current evaluation using subthreshold characteristics of cell transistors
Young Pil Kim, Beom Jun Jin, Sun-Ghil Lee, Siyoung Choi, Uin Chung, Joo Tae Moon, Kim, S.U.
Published in 2004 IEEE International Reliability Physics Symposium. Proceedings (2004)
Published in 2004 IEEE International Reliability Physics Symposium. Proceedings (2004)
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Conference Proceeding
Growth and characterization of ZnO thin films grown by pulsed laser deposition
Bae, Sang Hyuck, Lee, Sang Yeol, Jin, Beom Jun, Im, Seongil
Published in Applied surface science (15.01.2001)
Published in Applied surface science (15.01.2001)
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Journal Article
Front-end-of-line (FEOL) optimization for high-performance, high-reliable strained-Si MOSFETs; from virtual substrate to gate oxidation
LEE, Jong-Wook, LEE, Sun-Ghil, PARK, Seong-Geon, PARK, Hong-Bae, SON, Yong-Hoon, LEE, Young-Eun, JIN, Beom-Jun, LEE, Hye-Lan, KOO, Bon-Young, KANG, Sang-Bom, YU GYUN SHIN, CHUNG, U.-In, KIM, Young-Pil, MOON, Joo-Tae, RYU, Byung-Il, KIM, Chul-Sung, CHO, Hag-Ju, KIM, Seung-Beom, JUNG, In-Soo, LEE, Deok-Hyung, KIM, Dong-Chan, JEON, Taek-Soo
Published in IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004 (2004)
Published in IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004 (2004)
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Conference Proceeding
A comparative analysis of thermal gate oxide on strained Si/relaxed SiGe layer for reliability prediction of strained Si MOSFETs
Lee, Sun-Ghil, Kim, Young Pil, Lee, Hye-Lan, Jin, Beom Jun, Lee, Jong-Wook, Shin, Yu Gyun, Choi, Siyoung, Chung, U-In, Moon, Joo Tae
Published in Materials science in semiconductor processing (01.02.2005)
Published in Materials science in semiconductor processing (01.02.2005)
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Journal Article