Evaluation of the chemical states and electrical activation of ultra-highly B-doped Si1-xGex by ion implantation and subsequent nanosecond laser annealing
Lee, Kiseok, Jo, Chunghee, Yoon, Dongmin, Baik, Seunghyun, Ko, Dae-Hong
Published in Applied surface science (01.06.2024)
Published in Applied surface science (01.06.2024)
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Journal Article
Characteristics of high-order silane based Si and SiGe epitaxial growth under 600
Yoon, Dongmin, Shin, Hyerin, Oh, Seokmin, Jo, Chunghee, Lee, Kiseok, Jung, Seonwoong, Ko, Dae-Hong
Published in Journal of crystal growth (15.04.2024)
Published in Journal of crystal growth (15.04.2024)
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Journal Article
SEMICONDUCTOR DEVICE
Kim, Gyeom, Kim, Jinbum, Lee, Sangmoon, Jo, Chunghee, Park, Seran, Lee, Kiseok, Ko, Daehong, Byeon, Daeseop, Shin, Hyunsu
Year of Publication 09.11.2023
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Year of Publication 09.11.2023
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