New Observation of Mobility and Reliability Dependence on Mechanical Film Stress in Strained Silicon CMOSFETs
HAN, In-Shik, JI, Hee-Hwan, YOU, Ook-Sang, CHOI, Won-Ho, LIM, Jung-Eun, HWANG, Kyong-Jin, PARK, Sung-Hyung, LEE, Heui-Seung, KIM, Dae-Byung, LEE, Hi-Deok
Published in IEEE transactions on electron devices (01.06.2008)
Published in IEEE transactions on electron devices (01.06.2008)
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Journal Article
Characterization of Near-Interface Oxide Trap Density in Nitrided Oxides for Nanoscale MOSFET Applications
Younghwan Son, Chang-Ki Baek, In-Shik Han, Han-Soo Joo, Tae-Gyu Goo, Ooksang Yoo, Wonho Choi, Hee-Hwan Ji, Hi-Deok Lee, Kim, D.M.
Published in IEEE transactions on nanotechnology (01.09.2009)
Published in IEEE transactions on nanotechnology (01.09.2009)
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The Effect of Triple Capping Layer (Ti∕Ni∕TiN) on the Electrical and Structural Properties of Nickel Monosilicide
Kim, Yong-Jin, Choi, Chel-Jong, Jung, Ran-Ju, Oh, Soon-Young, Yun, Jang-Gn, Lee, Won-Jae, Ji, Hee-Hwan, Wang, Jin-Suk, Lee, Hi-Deok
Published in Journal of the Electrochemical Society (2006)
Published in Journal of the Electrochemical Society (2006)
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Investigation of Device Performance and Negative Bias Temperature Instability of Plasma Nitrided Oxide in Nanoscale p-Channel Metal–Oxide–Semiconductor Field-Effect Transistor's
Han, In-Shik, Ji, Hee-Hwan, Goo, Tae-Gyu, Yoo, Ook-Sang, Choi, Won-Ho, Kim, Yong-Goo, Park, Sung-Hyung, Lee, Heui-Seung, Kang, Young-Seok, Kim, Dae-Byung, Lee, Hi-Deok
Published in Japanese Journal of Applied Physics (01.04.2008)
Published in Japanese Journal of Applied Physics (01.04.2008)
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Journal Article
Co-Induced Low-Temperature Silicidation of Ni Germanosilicide Using NiPt Alloy and the Effect of Ge Ratio on Thermal Stability
YUN, Jang-Gn, OH, Soon-Young, CHA, Han-Seob, HU, Sang-Bum, LEE, Jeong-Gun, LEE, Hi-Deok, HUANG, Bin-Feng, KIM, Yong-Jin, JI, Hee-Hwan, KIM, Yong-Goo, PARK, Sung-Hyung, LEE, Heui-Seung, KIM, Dae-Byung, KIM, Ui-Sik
Published in IEEE transactions on nanotechnology (01.09.2007)
Published in IEEE transactions on nanotechnology (01.09.2007)
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Journal Article
Thermal Stability Improvement of Ni-Germano silicide Utilizing Ni-Pd Alloy for Nanoscale CMOS Technology
Kim, Y.-J., Oh, S.-Y., Yun, J.-G., Lee, W.-J., Zhang, Y.-Y., Zhong, Z., Jung, S.-Y., Ji, H.-H., Cha, H.-S., Kim, Y.-C., Wang, J.-S., Lee, H.-D.
Published in IEEE transactions on nanotechnology (01.07.2007)
Published in IEEE transactions on nanotechnology (01.07.2007)
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Journal Article
Characterization of Nickel-Silicide Dependence on the Substrate Dopants for Nanoscale Complementary Metal Oxide Semiconductor Technology
Bae, Mi-Suk, Ji, Hee-Hwan, Lee, Hun-Jin, Oh, Soon-Young, Huang, Bin-Feng, Yun, Jang-Gn, Wang, Jin-Suk, Park, Seong-Hyung, Lee, Hi-Deok
Published in Japanese Journal of Applied Physics (01.01.2004)
Published in Japanese Journal of Applied Physics (01.01.2004)
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Journal Article
Novel Nitrogen Doped Ni Self-Alingned Silicide Process for Nanoscale Complementary Metal Oxide Semiconductor Technology
Oh, Soon-Young, Yun, Jang-Gn, Huang, Bin-Feng, Kim, Yong-Jin, Ji, Hee-Hwan, Kim, Ui-Sik, Cha, Han-Seob, Heo, Sang-Bum, Lee, Jeong-Gun, Wang, Jin-Suk, Lee, Hi-Deok
Published in Japanese Journal of Applied Physics (01.04.2005)
Published in Japanese Journal of Applied Physics (01.04.2005)
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Journal Article
Dependence of Analog and Digital Performances on Mechanical Film Stress of ILD Layers in Nanoscale CMOSFETs
Ji, Hee-Hwan, Park, Sung-Hyung, Kim, Yong-Goo, Wang, Jin-Suk, Lee, Hi-Deok, Baek, Seong-Hak, Kim, Kyoung-Cheol, Song, Byeung-Soo, Bae, Hui-Kyoung, Lee, Heui-Seung, Kang, Young-Seok, Kim, Dae-Byung, Park, Jin-Won
Published in Japanese Journal of Applied Physics (01.04.2005)
Published in Japanese Journal of Applied Physics (01.04.2005)
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Journal Article
Gate Engineering to Prevent NMOS Dopant Channeling for Nanoscale CMOSFET Technology
Park, Sung Hyung, Kim, Yong Goo, Ji, Hee Hwan, Lee, Hi Deok, Kim, Jae Sung, Baek, Seong Hak, Chang, Hoon, Lee, Jin Hyuk, Kim, Kyoung Cheol, Song, Byeung Soo, Bae, Hui Koung, Kim, Myung Ok, Lee, Heui Seung, Kang, Young Seok, Kim, Dae Byung
Published in Japanese Journal of Applied Physics (01.04.2004)
Published in Japanese Journal of Applied Physics (01.04.2004)
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Journal Article
Highly thermal robust NiSi for nanoscale MOSFETs utilizing a novel hydrogen plasma immersion ion implantation and Ni-Co-TiN tri-layer
YUN, Jang-Gn, OH, Soon-Young, HU, Sang-Bum, LEE, Jeong-Gun, BAEK, Sung-Kweon, HWANG, Hyun-Sang, LEE, Hi-Deok, HUANG, Bin-Feng, JI, Hee-Hwan, KIM, Yong-Goo, PARK, Seong-Hyung, LEE, Heui-Seung, KIM, Dae-Byung, KIM, Ui-Sik, CHA, Han-Seob
Published in IEEE electron device letters (01.02.2005)
Published in IEEE electron device letters (01.02.2005)
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Journal Article
Characterization of the Co-Silicide Penetration Depth into the Junction Area for 0.15 and Sub-0.15 Micron CMOS Technology
Lee, Hi-Deok, Bae, Mi-Suk, Ji, Hee-Hwan, Lee, Key-Min, Park, Seong-Hyun, Jang, Myoung-Jun, Lee, Joo-Hyoung, Yoon, Ki-Seok, Choi, Jung-Hoon, Park, Geun-Suk, Kang, Keun-Koo, Park, Young-Jin
Published in Japanese Journal of Applied Physics (01.04.2002)
Published in Japanese Journal of Applied Physics (01.04.2002)
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Journal Article
Novel test structures for on-chip characterization of coupling capacitance variation by in- and anti-phase crosstalk in multi-level metallization
Hi-Deok Lee, Hee-Hwan Ji, In-Sik Han, Han-Soo Joo, Dae-Mann Kim, Sung-Hyung Park, Heui-Seung Lee, Won-Joon Ho, Dae-Byung Kim, Ihl-Hyun Cho, Sang-Young Kim, Sung-Bo Hwang, Jeong-Gon Lee, Jin-Won Park
Published in 2006 IEEE International Conference on Microelectronic Test Structures (2006)
Published in 2006 IEEE International Conference on Microelectronic Test Structures (2006)
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Conference Proceeding
Accurate Extraction of Crosstalk Induced Dynamic Variation of Coupling Capacitance for Interconnect Lines of CMOSFETs
Kim, Yong-Goo, Ji, Hee-Hwan, Yoon, Hyung-Sun, Park, Sung-Hyung, Lee, Heui-Seung, Kang, Young-Seok, Kim, Dae-Byung, Kim, Dae-Mann, Lee, Hi-Deok
Published in Journal of semiconductor technology and science (2004)
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Published in Journal of semiconductor technology and science (2004)
Journal Article
Highly Thermal Immune Nitrogen-Doped Ni–Germanosilicide with Co/TiN Double Layer for Nano-Scale Complementary Metal Oxide Semiconductor Applications
Oh, Soon-Young, Yun, Jang-Gn, Kim, Yong-Jin, Lee, Won-Jae, Ji, Hee-Hwan, Tuya, Agchbayar, Kim, Do-Woo, Cha, Han-Seob, Cho, Yoo-Jeong, Han, Kil-Jin, Kim, Yeong-Cheul, Wang, Jin-Suk, Lee, Hi-Deok
Published in Japanese Journal of Applied Physics (01.04.2006)
Published in Japanese Journal of Applied Physics (01.04.2006)
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Journal Article
Characterization of near-interface oxide trap density in remote plasma nitrided oxides for nano-scale MOSFETs
Younghwan Son, Chang-Ki Baek, Bomsoo Kim, In-Shik Han, Tae-Gyu Goo, Ooksang You, Wonho Choi, Hee-Hwan Ji, Hi-Deok Lee, Kim, D.M.
Published in 2006 IEEE Nanotechnology Materials and Devices Conference (01.10.2006)
Published in 2006 IEEE Nanotechnology Materials and Devices Conference (01.10.2006)
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Conference Proceeding
Abnormal Oxidation of Nickel Silicide on N-Type Substrate and Effect of Preamorphization Implantation
Yun, Jang-Gn, Oh, Soon-Young, Ji, Hee-Hwan, Huang, Bin-Feng, Park, Young-Ho, Wang, Jin-Suk, Park, Seong-Hyung, Bae, Tae-Sung, Lee, Hi-Deok
Published in Japanese Journal of Applied Physics (01.10.2004)
Published in Japanese Journal of Applied Physics (01.10.2004)
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Journal Article
Abnormal Oxidation of NiSi Formed on Arsenic-Doped Substrate
Yun, Jang-Gn, Ji, Hee-Hwan, Oh, Soon-Young, Bae, Mi-Suk, Lee, Hun-Jin, Huang, Bin-Feng, Kim, Yong-Goo, Wang, Jin-Suk, Sung, Nak-Gyun, Hu, Sang-Bum, Lee, Jeong-Gun, Park, Seong-Hyung, Lee, Hee-Seung, Ho, Won-Joon, Kim, Dae-Byung, Lee, Hi-Deok
Published in Electrochemical and solid-state letters (01.01.2004)
Published in Electrochemical and solid-state letters (01.01.2004)
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Journal Article
Highly thermal robust Ni-germanosilicide utilizing NiPt/Co/TiN tri-layer for CMOS application
YUN, Jang-Gn, OH, Soon-Young, LEE, Jeong-Gun, LEE, Hi-Deok, JI, Hee-Hwan, HUANG, Bin-Feng, PARK, Seong-Hyung, LEE, Heui-Seung, KIM, Dae-Byung, KIM, Ui-Sik, CHA, Han-Seob, HU, Sang-Bum
Published in 4th IEEE Conference on Nanotechnology, 2004 (2004)
Published in 4th IEEE Conference on Nanotechnology, 2004 (2004)
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Conference Proceeding