Nanocatalyst-induced hydroxyl radical (·OH) slurry for tungsten CMP for next-generation semiconductor processing
Poddar, Maneesh Kumar, Ryu, Heon-Yul, Yerriboina, Nagendra Prasad, Jeong, Yeon-Ah, Lee, Jung-Hwan, Kim, Tae-Gon, Kim, Jae-Hyun, Park, Jong-Dai, Lee, Min-Gun, Park, Chang-Yong, Han, Seong-Jun, Choi, Jae-Gon, Park, Jin-Goo
Published in Journal of materials science (01.03.2020)
Published in Journal of materials science (01.03.2020)
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Journal Article
Investigation of particle agglomeration with in-situ generation of oxygen bubble during the tungsten chemical mechanical polishing (CMP) process
Jeong, Yeon-Ah, Poddar, Maneesh Kumar, Ryu, Heon-Yul, Yerriboina, Nagendra Prasad, Kim, Tae-Gon, Kim, Jaehyun, Park, Jong-Dai, Lee, Mingun, Park, Chang-Yong, Han, Seongjun, Kim, Myeong-Jun, Park, Jin-Goo
Published in Microelectronic engineering (15.10.2019)
Published in Microelectronic engineering (15.10.2019)
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Journal Article
Nanocatalyst-induced hydroxyl radical
Poddar, Maneesh Kumar, Ryu, Heon-Yul, Yerriboina, Nagendra Prasad, Jeong, Yeon-Ah, Lee, Jung-Hwan, Kim, Tae-Gon, Kim, Jae-Hyun
Published in Journal of materials science (01.03.2020)
Published in Journal of materials science (01.03.2020)
Get full text
Journal Article