Formation of Source/Drain extension by Antimony implantation for high performance DRAM peripheral transistors
Jaechun Cha, Seungwoo Jin, Anbae Lee, Hun-Sung Lee, Dongseok Kim, Jihwan Park, Ilsik Jang, Ahyoung Oh, Se-Aug Jang, Seoungjin Yeom, Sungki Park, Cho, Cjay, Hwang, Sunny, Jongwon Park, Sungho Jo
Published in 2014 20th International Conference on Ion Implantation Technology (IIT) (01.06.2014)
Published in 2014 20th International Conference on Ion Implantation Technology (IIT) (01.06.2014)
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