2 Semiconductor device including two dimensional material and method of fabricating the same
KWON, JUN YOUNG, SHIN, KEUN WOOK, BYUN, KYUNG EUN, SEOL, MIN SU, JUNG, A LUM, YOO, MIN SEOK
Year of Publication 14.02.2024
Get full text
Year of Publication 14.02.2024
Patent
Interconnect structure and electronic device including the same
KIM, SANG WON, SHIN, KEUN WOOK, BYUN, KYUNG EUN, LEE, EUN KYU, LEE, CHANG SEOK, JUNG, A LUM, YOO, JOUNG EUN
Year of Publication 02.08.2023
Get full text
Year of Publication 02.08.2023
Patent
Graphene structure and method for forming the graphene structure
KIM, CHANG HYUN, BYUN, KYUNG EUN, SHIN, KEUN WOOK, LEE, EUN KYU, LEE, CHANG SEOK, SONG, HYUN JAE, JUNG, A LUM, SHIN, HYEON JIN
Year of Publication 09.11.2020
Get full text
Year of Publication 09.11.2020
Patent
Method for forming nanocrystalline graphene and device including the same
SHIN, KEUN WOOK, BYUN, KYUNG EUN, NAM, SEUNG GEOL, LIM HYUN SEOK, JUNG, A LUM, SONG, HYUN JAE, SHIN, HYEON JIN, CHO, YEON CHOO
Year of Publication 12.02.2020
Get full text
Year of Publication 12.02.2020
Patent
method for forming graphene
KIM, CHANG HYUN, SHIN, KEUN WOOK, NAM, SEUNG GEOL, BYUN, KYUNG EUN, LEE, EUN KYU, LEE, CHANG SEOK, SONG, HYUN JAE, JUNG, A LUM, SHIN, HYEON JIN, CHO, YEON CHOO
Year of Publication 14.05.2020
Get full text
Year of Publication 14.05.2020
Patent
PELLICLE COMPOSITION, PELLICLE FORMED FROM THE SAME, PRODUCTION METHOD THEREOF, RETICLE INCLUDING PELLICLE, AND EXPOSURE APPARATUS FOR LITHOGRAPHY INCLUDING RETICLE
SHIN HYEON-JIN, KIM SANG WON, LEE DONG-WOOK, LEE YUN SEONG, JUNG A LUM, JEONG SEONG JUN, SEOL MIN SU, PARK SEONG-JUN
Year of Publication 21.02.2019
Get full text
Year of Publication 21.02.2019
Patent
Interconnect structure and electric device employing the same
KIM, CHANG HYUN, NAM, SEUNG GEOL, SHIN, KEUN WOOK, BYUN, KYUNG EUN, LEE, EUN KYU, LEE, CHANG SEOK, SONG, HYUN JAE, JUNG, A LUM, SHIN, HYEON JIN, CHO, YEON CHOO
Year of Publication 05.02.2020
Get full text
Year of Publication 05.02.2020
Patent
Pellicle composition for photomask pellicle for photomask formed therefrom preparing method thereof reticle including the pellicle and exposure apparatus for lithography including the reticle
LEE, YUN SEONG, JEONG, SEONG JUN, PARK, SEONG JUN, KIM, SANG WON, SEOL, MIN SU, JUNG, A LUM, SHIN, HYEON JIN, LEE, DONG WOOK
Year of Publication 11.02.2019
Get full text
Year of Publication 11.02.2019
Patent
Method of preparing graphene quantum dot hardmask composition including the graphene quantum dot obtained by the method method of forming patterning using the hardmask composition and hardmask formed from the hardmask composition
LEE, YUN SEONG, JEONG, SEONG JUN, KIM, SANG WON, SEOL, MIN SU, JUNG, A LUM, SHIN, HYEON JIN, LEE, DONG WOOK
Year of Publication 11.02.2019
Get full text
Year of Publication 11.02.2019
Patent
Hardmask composition method of forming patterning using the hardmask composition and hardmask formed from the hardmask composition
LEE, YUN SEONG, JEONG, SEONG JUN, PARK, SEONG JUN, KIM, SANG WON, SEOL, MIN SU, JUNG, A LUM, SHIN, HYEON JIN, LEE, DONG WOOK
Year of Publication 23.01.2019
Get full text
Year of Publication 23.01.2019
Patent