Thermal chemical vapor deposition system and operating method thereof
Hsieh, Jheng-Uei, Lo, Yen-Chan, Liao, Si-Wen, Lai, Yi-Fang, Hsu, Kai-Shiung, Lin, Shian-Huei, Liu, Ding-I, Hsu, Jui-Fu, Leu, Po-Hsiung, Wu, Cheng-Tsung
Year of Publication 28.07.2020
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Year of Publication 28.07.2020
Patent
Thermal chemical vapor deposition system and operating method thereof
Hsieh, Jheng-Uei, Lo, Yen-Chan, Liao, Si-Wen, Lai, Yi-Fang, Hsu, Kai-Shiung, Lin, Shian-Huei, Liu, Ding-I, Hsu, Jui-Fu, Leu, Po-Hsiung, Wu, Cheng-Tsung
Year of Publication 25.12.2018
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Year of Publication 25.12.2018
Patent
Thermal Chemical Vapor Deposition System and Operating Method Thereof
Hsieh, Jheng-Uei, Lo, Yen-Chan, Liao, Si-Wen, Lai, Yi-Fang, Hsu, Kai-Shiung, Lin, Shian-Huei, Liu, Ding-I, Hsu, Jui-Fu, Leu, Po-Hsiung, Wu, Cheng-Tsung
Year of Publication 22.11.2018
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Year of Publication 22.11.2018
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THERMAL CHEMICAL VAPOR DEPOSITION SYSTEM AND OPERATING METHOD THEREOF
LIAO Si-Wen, WU Cheng-Tsung, LO Yen-Chan, LAI Yi-Fang, LIN Shian-Huei, LIU Ding-I, LEU Po-Hsiung, HSIEH Jheng-Uei, HSU Jui-Fu, HSU Kai-Shiung
Year of Publication 20.04.2017
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Year of Publication 20.04.2017
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Thermal chemical vapor deposition system and method for treating substrate
HSIEH, JHENG UEI, LIU, DING I, LIN, SHIAN HUEI, LO, YEN CHAN, LIAO, SI WEN, WU, CHENG TSUNG, LEU, PO HSIUNG, HSU, KAI SHIUNG, HSU, JUI FU, LAI, YI FANG
Year of Publication 21.09.2018
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Year of Publication 21.09.2018
Patent
Thermal chemical vapor deposition system and operating method thereof
LIN, SHIAN-HUEI, WU, CHENG-TSUNG, LEU, PO-HSIUNG, HSU, JUI-FU, HSIEH, JHENG-UEI, LIAO, SI-WEN, LO, YENAN, LAI, YI-FANG, LIU, DING-I, HSU, KAI-SHIUNG
Year of Publication 16.05.2017
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Year of Publication 16.05.2017
Patent
Thermal chemical vapor deposition system and operating method thereof
JUI-FU HSU, JHENG-UEI HSIEH, DING-I LIU, PO-HSIUNG LEU, SHIAN-HUEI LIN, CHENG-TSUNG WU, YENAN LO, YI-FANG LAI, KAI-SHIUNG HSU, SI-WEN LIAO
Year of Publication 04.07.2017
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Year of Publication 04.07.2017
Patent