A New Platform for ArF Lithography
Kim, Hyun-Woo, Choi, Sang-Jun, Woo, Sang-Gyun, Moon, Joo-Tae
Published in Journal of Photopolymer Science and Technology (2000)
Published in Journal of Photopolymer Science and Technology (2000)
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Journal Article
Plasma-Assisted Dry Etching of Ferroelectric Capacitor Modules and Application to a 32M Ferroelectric Random Access Memory Devices with Submicron Feature Sizes
Lee, Sang-Woo, Joo, Suk-Ho, Cho, Sung Lae, Son, Yoon-Ho, Lee, Kyu-Mann, Nam, Sang-Don, Park, Kun-Sang, Lee, Yong-Tak, Seo, Jung-Suk, Kim, Young-Dae, An, Hyeong-Geun, Kim, Hyoung-Joon, Jung, Yong-Ju, Heo, Jang-Eun, Lee, Moon-Sook, Park, Soon-Oh, Chung, U-In, Moon, Joo-Tae
Published in Japanese Journal of Applied Physics (01.01.2002)
Published in Japanese Journal of Applied Physics (01.01.2002)
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Journal Article
A Novel Platform for Production-worthy ArF Resist
Kim, Hyun-Woo, Choi, Sang-Jun, Jung, Dong-Won, Lee, Sook, Lee, Sung-Ho, Kang, Yool, Woo, Sang-Gyun, Moon, Joo-Tae, Kavanagh, Robert, Barclay, George, Orsula, George, Mattia, Joe, Caporale, Stefan, Adams, Tim, Tanaka, Tsutomu, Kang, Doris
Published in Journal of Photopolymer Science and Technology (2001)
Published in Journal of Photopolymer Science and Technology (2001)
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Journal Article
Body-tied triple-gate NMOSFET fabrication using bulk Si wafer
Park, Tai-su, Choi, Siyoung, Lee, Deok-Hyung, Chung, U-In, Moon, Joo Tae, Yoon, Euijoon, Lee, Jong-Ho
Published in Solid-state electronics (01.03.2005)
Published in Solid-state electronics (01.03.2005)
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Journal Article
Selective Epitaxial Growth of Silicon for Vertical Diode Application
Lee, Kong-Soo, Yoo, Dae-Han, Han, Jae-Jong, Hyung, Yong-Woo, Kim, Seok-Sik, Kang, Chang-Jin, Jeong, Hong-Sik, Moon, Joo-Tae, Park, Hyunho, Jeong, Hanwook, Kim, Kwang-Ryul, Choi, Byoungdeog
Published in Japanese Journal of Applied Physics (01.08.2010)
Published in Japanese Journal of Applied Physics (01.08.2010)
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Journal Article
Leakage Current Reduction Mechanism of Oxide–Nitride–Oxide Inter-Poly Dielectrics through the Post Plasma Oxidation Treatment
Lee, Woong, Jee, Jeonggeun, Yoo, Dae-Han, Lee, Eun-Young, Bok, Jinkwon, Hyung, Younwoo, Kim, Seoksik, Kang, Chang-Jin, Moon, Joo-Tae, Roh, Yonghan
Published in Japanese Journal of Applied Physics (01.04.2011)
Published in Japanese Journal of Applied Physics (01.04.2011)
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Journal Article
Application of VEMA type ArF Resist to Sub-100nm Lithography
Kim, Hyun-Woo, Lee, Sook, Choi, Sang-Jun, Woo, Sang-Gyun, Chae, Yun-Sook, Kim, Jisoo, Moon, Joo-Tae, Kavanagh, Robert, Barclay, George
Published in Journal of Photopolymer Science and Technology (01.01.2002)
Published in Journal of Photopolymer Science and Technology (01.01.2002)
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Journal Article
Low-Temperature Solid Phase Epitaxial Regrowth of Silicon for Stacked Static Random Memory Application
Lee, Kong-Soo, Yeo, Chadong, Yoo, Dae-Han, Kim, Seok-Sik, Moon, Joo-Tae, Jung, Soon-Moon, Son, Yong-Hoon, Park, Hyunho, Jeong, Hanwook, Kim, Kwang-Ryul, Choi, Byoungdeog
Published in Japanese Journal of Applied Physics (01.01.2011)
Published in Japanese Journal of Applied Physics (01.01.2011)
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Journal Article
Development and evaluation of highly efficient neutral beam source
Hwang, Sung-Wook, Lee, Do-Haing, Shin, Chul Ho, Tokashiki, Ken, Min, Gyeong-Jin, Kang, Chang Jin, Cho, Han Ku, Moon, Joo Tae, Lee, Jinseok, Jeon, Yunkwang, Lee, Yvette, Kam, Doyoung
Published in Surface & coatings technology (05.08.2007)
Published in Surface & coatings technology (05.08.2007)
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Journal Article
Conference Proceeding
New ArF Single-Layer Resist for 193-nm Lithography
Choi, Sang-Jun, Kang, Yool, Jung, Dong-Won, Park, Chun-Geun, Moon, Joo-Tae, Lee, Moon-Yong
Published in Journal of Photopolymer Science and Technology (1997)
Published in Journal of Photopolymer Science and Technology (1997)
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Journal Article
Selective Epitaxial Growth of Silicon Layer Using Batch-Type Equipment for Vertical Diode Application to Next Generation Memories
Lee, Kong-Soo, Yoo, Dae-Han, Yoo, Young-Sub, Han, Jae-Jong, Kim, Seok-Sik, Jeong, Hong-Sik, Kang, Chang-Jin, Moon, Joo-Tae, Park, Hyunho, Jeong, Hanwook, Kim, Kwang-Ryul, Choi, Byoungdeog
Published in ECS transactions (01.01.2010)
Published in ECS transactions (01.01.2010)
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Journal Article
A New 193 nm Single Layer Resist Based on Cycloolefin Maleic Anhydride Polymers
Lee, Si-Hyeung, Kwon, Ki-Young, Jung, Dong-Won, Lee, Sook, Yoon, Kwang-Sub, Kim, Hyun-Woo, Choi, Sang-Jun, Woo, Sang-Gyun, Moon, Joo-Tae
Published in Journal of photopolymer science and technology (2000)
Published in Journal of photopolymer science and technology (2000)
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Journal Article
Hot-Spot Detection and Correction Using Full-Chip-Based Process Window Analysis
Kim, Sang-Wook, Suh, Sung-Soo, Chun, Yong-Jin, Kim, Young-Chang, Lee, Suk-Joo, Lee, Jung-Hyeon, Choi, Sung-Woon, Kang, Chang-Jin, Han, Woo-Sung, Moon, Joo-Tae
Published in Japanese Journal of Applied Physics (01.06.2008)
Published in Japanese Journal of Applied Physics (01.06.2008)
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Journal Article
Investigation of Ni/Co bilayer salicidation process for sub-40 nm gate technology
Jung, Eun Ji, Jung, Sug-Woo, Kim, Hyun-Su, Yun, Jong-Ho, Cheong, Seong Hwee, Kim, Byung Hee, Choi, Gil Heyun, Kim, Sung Tae, Chung, U-In, Moon, Joo Tae, Ryu, Byung Il
Published in Microelectronic engineering (01.12.2005)
Published in Microelectronic engineering (01.12.2005)
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Journal Article
Conference Proceeding
Investigation of Ni/Co bilayer salicidation process for sub-40nm gate technology
Jung, Eun Ji, Jung, Sug-Woo, Kim, Hyun-Su, Yun, Jong-Ho, Cheong, Seong Hwee, Kim, Byung Hee, Choi, Gil Heyun, Kim, Sung Tae, Chung, U-In, Moon, Joo Tae, Ryu, Byung Il
Published in Microelectronic engineering (01.12.2005)
Published in Microelectronic engineering (01.12.2005)
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Journal Article
A study on the Pt electrode etching for 0.15 μm technologies
Kim, Hyoun-Woo, Ju, Byong-Sun, Kang, Chang-Jin, Moon, Joo-Tae
Published in Microelectronic engineering (01.01.2003)
Published in Microelectronic engineering (01.01.2003)
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Journal Article
Patterning of W/WNx/poly-Si gate electrode using Cl2/O2 plasmas
KIM, Hyoun-Woo, JU, Byong-Sun, KANG, Chang-Jin, MOON, Joo-Tae
Published in Microelectronic engineering (01.03.2003)
Published in Microelectronic engineering (01.03.2003)
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Journal Article