Chemical Vapor-Deposited Vanadium Pentoxide Nanosheets with Highly Stable and Low Switching Voltages for Effective Selector Devices
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Published in ACS applied materials & interfaces (12.12.2018)
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Published in Surfaces and interfaces (01.10.2023)
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Line fitting based segmentation and its application to skin image analysis
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Published in 2015 IEEE 5th International Conference on Consumer Electronics - Berlin (ICCE-Berlin) (01.09.2015)
Published in 2015 IEEE 5th International Conference on Consumer Electronics - Berlin (ICCE-Berlin) (01.09.2015)
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Suppressed weak antilocalization in the topological insulator Bi2Se3 proximity coupled to antiferromagnetic NiO
Bhowmick, Tushar, Jerng, Sahng-Kyoon, Jeon, Jae Ho, Roy, Sanjib Baran, Kim, Yong Hyeon, Seo, Junho, Kim, Jun Sung, Chun, Seung-Hyun
Published in Nanoscale (14.01.2017)
Published in Nanoscale (14.01.2017)
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METHOD AND APPARATUS FOR CONTROLLING UPLINK TRANSMISSION POWER IN WIRELESS COMMUNICATION SYSTEM
LEE, NEUNG HYUNG, HWANG, SUNG SOO, MIN, SEUNG HYUN, MAENG, SEUNG JOO, KIM, NAM HOON, JEON, JAE HO
Year of Publication 17.07.2012
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Highly Desirable Platform for Efficient Hydrogen Generation: Electrodeposited CoP on N‑Doped Vertical Graphene
Roy, Sanjib Baran, Truong, Linh, Jeon, Jae Ho, Lee, Sunghun, Jerng, Sahng-Kyoon, Jung, Euigeol, Chan Jun, Seong, Chun, Seung-Hyun
Published in ACS applied energy materials (28.06.2021)
Published in ACS applied energy materials (28.06.2021)
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FILLER WIRE FOR WELDING AND METHOD OF WELDING USING THE FILLER WIRE
SHIN, HEE SEOP, CHO, SANG MYUNG, SEO, JI SEOK, HAM, HYO SIK, JEON, JAE HO
Year of Publication 12.12.2011
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Year of Publication 12.12.2011
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Bifunctional Electrodeposited 3D NiCoSe 2 /Nickle Foam Electrocatalysts for Its Applications in Enhanced Oxygen Evolution Reaction and for Hydrazine Oxidation
Akbar, Kamran, Jeon, Jae Ho, Kim, Minsoo, Jeong, Junkyeong, Yi, Yeonjin, Chun, Seung-Hyun
Published in ACS sustainable chemistry & engineering (04.06.2018)
Published in ACS sustainable chemistry & engineering (04.06.2018)
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Journal Article
Suppressed weak antilocalization in the topological insulator Bi2Se3 proximity coupled to antiferromagnetic NiOElectronic supplementary information (ESI) available: RHEED image after 2 nm growth, temperature dependence of NiO magnetization, magnetoresistance at various temperatures, comparison of 5 nm-thick Bi2Se3 on sapphire and NiO, and HLN fitting parameters from various fitting schemes. See DOI: 10.1039/c6nr06795f
Bhowmick, Tushar, Jerng, Sahng-Kyoon, Jeon, Jae Ho, Roy, Sanjib Baran, Kim, Yong Hyeon, Seo, Junho, Kim, Jun Sung, Chun, Seung-Hyun
Year of Publication 05.01.2017
Year of Publication 05.01.2017
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Journal Article
Suppressed weak antilocalization in the topological insulator Bi 2 Se 3 proximity coupled to antiferromagnetic NiO
Bhowmick, Tushar, Jerng, Sahng-Kyoon, Jeon, Jae Ho, Roy, Sanjib Baran, Kim, Yong Hyeon, Seo, Junho, Kim, Jun Sung, Chun, Seung-Hyun
Published in Nanoscale (05.01.2017)
Published in Nanoscale (05.01.2017)
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Journal Article