Search Results - "JENS HASSMANN" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Design-enabled manufacturing enablement using manufacturing design request tracker (MDRT)

Design-enabled manufacturing enablement using manufacturing design request tracker (MDRT)

by Sultan, Akif, Desineni, Rao, Hassmann, Jens, Hoeppner, Kristina, Ramanathan, Eswar, Babcock, Carl, Chua, Kok Peng, Teoh, Edward, Dai, Vito, Yeo, Sky, Hui, Colin, Capodieci, Luigi, McGowan, Sarah, Madge, Robert
Published in ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference (01.05.2013)

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Conference Proceeding

VERFAHREN ZUR OVERLAY-EINSTELLUNG ZWEIER MASKENEBENEN BEI EINEM PHOTOLITHOGRAPHISCHEN PROZESS

VERFAHREN ZUR OVERLAY-EINSTELLUNG ZWEIER MASKENEBENEN BEI EINEM PHOTOLITHOGRAPHISCHEN PROZESS

by HASSMANN, JENS
Year of Publication 15.12.2005

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Patent

Method for adjusting the overlay of two masking levels in a photolithographic process

Method for adjusting the overlay of two masking levels in a photolithographic process

by HASSMANN, JENS
Year of Publication 30.11.2005

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Patent

Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit

Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit

by Hassmann, Jens
Year of Publication 22.02.2005

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Patent

Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit

Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit

by HASSMANN JENS
Year of Publication 22.02.2005

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Patent

Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit

Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit

by HASSMANN JENS
Year of Publication 27.05.2004

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Patent

Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit

Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit

by Hassmann, Jens
Year of Publication 27.05.2004

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Patent

Method for adjusting the overlay of two masking levels in a photolithographic process

Method for adjusting the overlay of two masking levels in a photolithographic process

by HASSMANN, JENS
Year of Publication 02.01.2004

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Patent

Metal line layout based on line shifting

Metal line layout based on line shifting

by Lehr Matthias U, Hassmann Jens, Herrmann Thomas, Kuncha Rakesh Kumar, Meyer Moritz Andreas, Melde Thomas
Year of Publication 20.02.2018

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Patent

METAL LINE LAYOUT BASED ON LINE SHIFTING

METAL LINE LAYOUT BASED ON LINE SHIFTING

by Lehr Matthias U, Hassmann Jens, Herrmann Thomas, Kuncha Rakesh Kumar, Meyer Moritz Andreas, Melde Thomas
Year of Publication 17.08.2017

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Patent

Metal line layout based on line shifting

Metal line layout based on line shifting

by KUNCHA, RAKESH KUMAR, LEHR, MATTHIAS U, HASSMANN, JENS, MELDE, THOMAS, HERRMANN, THOMAS, MEYER, MORITZ ANDREAS
Year of Publication 01.07.2019

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Patent

METHOD FOR ADJUSTING THE OVERLAY OF TWO MASKING PLANES IN A PHOTOLITHOGRAPHIC PROCESS

METHOD FOR ADJUSTING THE OVERLAY OF TWO MASKING PLANES IN A PHOTOLITHOGRAPHIC PROCESS

by HASSMANN, JENS
Year of Publication 24.12.2003

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Patent

METHOD FOR ADJUSTING THE OVERLAY OF TWO MASKING PLANES IN A PHOTOLITHOGRAPHIC PROCESS

METHOD FOR ADJUSTING THE OVERLAY OF TWO MASKING PLANES IN A PHOTOLITHOGRAPHIC PROCESS

by HASSMANN, JENS
Year of Publication 02.10.2003

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Patent

Metal line layout based on line shifting

Metal line layout based on line shifting

by KUNCHA, RAKESH KUMAR, LEHR, MATTHIAS U, HASSMANN, JENS, MELDE, THOMAS, HERRMANN, THOMAS, MEYER, MORITZ ANDREAS
Year of Publication 16.11.2017

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Patent

METHOD FOR ADJUSTING THE OVERLAY OF TWO MASKING PLANES IN A PHOTOLITHOGRAPHIC PROCESS FOR THE PRODUCTION OF AN INTEGRATED CIRCUIT

METHOD FOR ADJUSTING THE OVERLAY OF TWO MASKING PLANES IN A PHOTOLITHOGRAPHIC PROCESS FOR THE PRODUCTION OF AN INTEGRATED CIRCUIT

by HASSMANN, JENS
Year of Publication 10.10.2002

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Patent

Metal line layout based on line shifting

Metal line layout based on line shifting

by MORITZ ANDREAS MEYER, THOMAS HERRMANN, THOMAS MELDE, RAKESH KUMAR KUNCHA, JENS HASSMANN, MATTHIAS U. LEHR
Year of Publication 25.08.2017

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Patent

Alignment error compensation method for exposure system used for semiconductor circuit manufacture calculates adjustment correction values dependent on alignment error between exposure planes

Alignment error compensation method for exposure system used for semiconductor circuit manufacture calculates adjustment correction values dependent on alignment error between exposure planes

by PFORR, RAINER, HASSMANN, JENS, WERNEKE, TORSTEN
Year of Publication 21.03.2002

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Patent

Twin-mask lithography for a substrate surface coated with a photo varnish, to form an electronic integrated circuit, has light shrouding main and auxiliary structures which are used with illumination

Twin-mask lithography for a substrate surface coated with a photo varnish, to form an electronic integrated circuit, has light shrouding main and auxiliary structures which are used with illumination

by ANKE, INES, HASSMANN, JENS, KOESTLER, WOLFRAM, HAFFNER, HENNING
Year of Publication 15.09.2005

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Patent

Method for producing a mask adapted to an exposure apparatus

Method for producing a mask adapted to an exposure apparatus

by HASSMANN, JENS, SCHEDEL, THORSTEN, KUNKEL, GERHARD, SCHROEDER, UWE PAUL, VOIGT, INA
Year of Publication 21.08.2005

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Patent

Method for producing a mask adapted to an exposure apparatus

Method for producing a mask adapted to an exposure apparatus

by KOWALEWSKI JOHANNES, SCHEDEL THORSTEN, VOIGT INA, KUNKEL GERHARD, HASSMANN JENS, SCHRODER UWE P
Year of Publication 19.05.2005

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Patent