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Published in Meeting abstracts (Electrochemical Society) (01.09.2016)
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Metalorganic Chemical Vapor Deposition of Thin Film ZrO 2 and Pb(Zr,Ti)O 3 : Precursor Chemistry and Process Characteristics
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Published in Japanese Journal of Applied Physics (30.11.2002)
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Hendrix, Bryan C, Bilodeau, Steven M, Hunks, William, Xu, Chongying, Roeder, Jeffrey F, Li, Weimin
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Thick electrodes for high frequency high Q tunable ferroelectric thin film varactors
Stauf, Gregory T., Ragaglia, Craig, Roeder, Jeffrey F., Vestyck, Dan, Maria, Jon-Paul, Ayguavives, Tito, Kingon, Angus, Mortazawi, Amir, Tombak, Ali
Published in Integrated ferroelectrics (01.01.2001)
Published in Integrated ferroelectrics (01.01.2001)
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CONTROLLER CONTROLLED INSTRUMENT PRELOAD MECHANISM
BRENNAN-MARQUEZ, Thomas, HOLOP, Robert E, MCGROGAN, Anthony K, ROEDER, Jeffrey R, HOURTASH, Arjang, M, MITRA, Probal, GOMEZ, Daniel, H
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PRECURSORS FOR SILICON DIOXIDE GAP FILL
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Year of Publication 04.08.2016
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Contribution of dielectric and metallic losses in RF/microwave tunable varactors using (Ba,Sr)TiO 3 thin films
Ayguavives, Francisco, Jin, Zhang, Tombak, Ali, Maria, Jon Paul, Mortazawi, Amir, Kingon, Angus I., Stauf, Gregory T., Ragaglia, Craig, Roeder, Jeffrey F., Brand, Mike
Published in Integrated ferroelectrics (01.01.2001)
Published in Integrated ferroelectrics (01.01.2001)
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Tellurium compounds useful for deposition of tellurium containing materials
Stender Matthias, Hunks William, Chen Tianniu, Chen Philip S. H, Baum Thomas H, Xu Chongying, Roeder Jeffrey F
Year of Publication 03.01.2017
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Year of Publication 03.01.2017
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