LOW TEMPERATURE DEPOSITION OF PHASE CHANGE MEMORY MATERIALS
STAUF, GREGORY, T, XU, CHONGYING, BAUM, THOMAS, H, STENDER, MATTHIAS, HENDRIX, BRYAN, C, CHEN, TIANNIU, ROEDER, JEFFREY, F, HUNKS, WILLIAM
Year of Publication 27.05.2009
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Year of Publication 27.05.2009
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Chemical vapor deposition of high conductivity, adherent thin films of ruthenium
ROEDER JEFFREY F, XU CHONGYING, WELCH JAMES J, BILODEAU STEVEN M, BAUM THOMAS H, HENDRIX BRYAN C
Year of Publication 23.10.2007
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Year of Publication 23.10.2007
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Chemical vapor deposition of high conductivity, adherent thin films of ruthenium
Hendrix, Bryan C, Welch, James J, Bilodeau, Steven M, Roeder, Jeffrey F, Xu, Chongying, Baum, Thomas H
Year of Publication 23.10.2007
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Year of Publication 23.10.2007
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LOW TEMPERATURE DEPOSITION OF PHASE CHANGE MEMORY MATERIALS
STENDER MATTHIAS, ROEDER JEFFREY F, HUNKS WILLIAM, XU CHONGYING, STAUF GREGORY T, BAUM THOMAS H, CHEN TIANNIU, HENDRIX BRYAN C
Year of Publication 14.05.2009
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Year of Publication 14.05.2009
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NOVEL BISMUTH PRECURSORS FOR CVD/ALD OF THIN FILMS
XU, CHONGYING, STAUF, GREGORY, T, STENDER, MATTHIAS, HENDRIX, BRYAN, C, CHEN, TIANNIU, ROEDER, JEFFREY, F, HUNKS, WILLIAM, CAMERON, THOMAS, M
Year of Publication 07.05.2009
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Year of Publication 07.05.2009
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CHEMICAL VAPOR DEPOSITION OF HIGH CONDUCTIVITY, ADHERENT THIN FILMS OF RUTHENIUM
ROEDER JEFFREY F, XU CHONGYING, WELCH JAMES J, BILODEAU STEVEN M, BAUM THOMAS H, HENDRIX BRYAN C
Year of Publication 20.09.2007
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Year of Publication 20.09.2007
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Precursors for silicon dioxide gap fill
XU, CHONGYING, LI, WEI-MIN, ROEDER, JEFFREY F, HENDRIX, BRYAN C, HUNKS, WILLIAM, BILODEAU, STEVEN M
Year of Publication 16.09.2014
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Year of Publication 16.09.2014
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Doped zro2 capacitor materials and structures, methods of making dielectric material structures, and methods of fabricating microelectronic devices
XU, CHONGYING, ROEDER, JEFFREY F, HENDRIX, BRYAN C, CAMERON, THOMAS M, CHEN, TIANNIU, BILODEAU, STEVEN M, STAUF, GREGORY T
Year of Publication 21.10.2015
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Year of Publication 21.10.2015
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Method of passivating chemical mechanical polishing compositions for copper film planarization processes
DARSILLO MICHAEL, ROEDER JEFFREY F, LIU JUN, KING MACKENZIE, BOGGS KARL E, BAUM THOMAS H
Year of Publication 01.12.2005
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Year of Publication 01.12.2005
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Passivative chemical mechanical polishing composition for copper film planarization
DARSILLO MICHAEL, ROEDER JEFFREY F, LIU JUN, KING MACKENZIE, BOGGS KARL E, BAUM THOMAS H
Year of Publication 17.11.2005
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Year of Publication 17.11.2005
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LOW TEMPERATURE DEPOSITION OF PHASE CHANGE MEMORY MATERIALS
STENDER MATTHIAS, ROEDER JEFFREY F, HUNKS WILLIAM, XU CHONGYING, STAUF GREGORY T, BAUM THOMAS H, CHEN TIANNIU, HENDRIX BRYAN C
Year of Publication 20.02.2009
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Year of Publication 20.02.2009
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SOURCE REAGENT COMPOSITION FOR CVD FORMATION OF Zr/Hf DOPED GATE DIELECTRIC AND HIGH DIELECTRIC CONSTANT METAL OXIDE THIN FILMS AND METHOD OF USING SAME
XU, CHONGYING, BAUM, THOMAS, H, PAW, WITOLD, ROEDER, JEFFREY, F, WANG, ZIYUN, HENDRIX, BRIAN, C
Year of Publication 04.07.2007
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Year of Publication 04.07.2007
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