Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride
Wang, Ziyun, Xu, Chongying, Laxman, Ravi K, Baum, Thomas H, Hendrix, Bryan, Roeder, Jeffrey
Year of Publication 12.05.2009
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Year of Publication 12.05.2009
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Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride
LAXMAN RAVI K, XU CHONGYING, ROEDER JEFFREY, BAUM THOMAS H, HENDRIX BRYAN, WANG ZIYUN
Year of Publication 12.05.2009
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Year of Publication 12.05.2009
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NANOPOROUS LOW-K FILMS WITH INFILTRATED POROSITY
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Year of Publication 07.05.2009
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Amorphous Ge/Te deposition process
STENDER MATTHIAS, ROEDER JEFFREY F, HUNKS WILLIAM, XU CHONGYING, CHEN PHILIP S. H, LI WEIMIN, CHEN TIANNIU
Year of Publication 10.01.2012
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Year of Publication 10.01.2012
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ELECTRODE ASSEMBLY FOR ANALYSIS OF METAL ELECTROPLATING SOLUTIONS
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Year of Publication 09.04.2009
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Year of Publication 09.04.2009
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COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF SILICON-CONTAINING FILMS
ROEDER JEFFREY F, XU CHONGYING, BAUM THOMAS H, HENDRIX BRYAN, WANG ZIYUN
Year of Publication 02.04.2009
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Year of Publication 02.04.2009
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Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride
ROEDER JEFFREY F, LAXMAN RAVI K, XU CHONGYING, BAUM THOMAS H, WANG ZIYUN, HENDRIX BRYAN C
Year of Publication 31.08.2010
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Year of Publication 31.08.2010
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Precursors for silicon dioxide gap fill
LI, WEIMIN, XU, CHONGYING, ROEDER, JEFFREY F, HENDRIX, BRYAN C, WILLIAM HUNKS, BILODEAU, STEVEN M
Year of Publication 01.11.2016
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Year of Publication 01.11.2016
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Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films
ROEDER JEFFREY F, XU CHONGYING, BAUM THOMAS H, CHEN TIANNIU, WANG ZIYUN, HENDRIX BRYAN C
Year of Publication 24.08.2010
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Year of Publication 24.08.2010
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PRECURSORS FOR SILICON DIOXIDE GAP FILL
ROEDER JEFFREY F, HUNKS WILLIAM, XU CHONGYING, BILODEAU STEVEN M, LI WEIMIN, HENDRIX BRYAN C
Year of Publication 01.07.2010
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Year of Publication 01.07.2010
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ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN FILMS
STENDER MATTHIAS, CHEN PHILIP S.H, ROEDER JEFFREY F, HUNKS WILLIAM, XU CHONGYING, STAUF GREGORY T, BAUM THOMAS H, CHEN TIANNIU, HENDRIX BRYAN C
Year of Publication 27.10.2011
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Year of Publication 27.10.2011
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