Metallo-organic low-pressure chemical vapor deposition of Ta2O5 using TaC12H30O5N as precursor for batch fabrication of microsystems
Briand, Danick, Mondin, Gianni, Jenny, Sabine, van der Wal, Peter D., Jeanneret, Sylvain, de Rooij, Nico F., Banakh, Oksana, Keppner, Herbert
Published in Thin solid films (22.12.2005)
Published in Thin solid films (22.12.2005)
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