A new automated scheme of quadrilateral mesh generation for randomly distributed line constraints
Park, Changhyup, Noh, Jae-Seung, Jang, Il-Sik, Kang, Joe M.
Published in Computer aided design (01.04.2007)
Published in Computer aided design (01.04.2007)
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Journal Article
Development of a fast transient simulator for gas–liquid two-phase flow in pipes
Choi, Jinho, Pereyra, Eduardo, Sarica, Cem, Lee, Hoyoung, Jang, Il Sik, Kang, JooMyoung
Published in Journal of petroleum science & engineering (01.02.2013)
Published in Journal of petroleum science & engineering (01.02.2013)
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Journal Article
Gate-first high-k/metal gate DRAM technology for low power and high performance products
Sung, Minchul, Jang, Se-Aug, Lee, Hyunjin, Ji, Yun-Hyuck, Kang, Jae-Il, Jung, Tae-O, Ahn, Tae-Hang, Son, Yun-Ik, Kim, Hyung-Chul, Lee, Sun-Woo, Lee, Seung-Mi, Lee, Jung-Hak, Baek, Seung-Beom, Doh, Eun-Hyup, Cho, Heung-Jae, Jang, Tae-Young, Jang, Il-Sik, Han, Jae-Hwan, Ko, Kyung-Bo, Lee, Yu-Jun, Shin, Su-Bum, Yu, Jae-Seon, Cho, Sung-Hyuk, Han, Ji-Hye, Kang, Dong-Kyun, Kim, Jinsung, Lee, Jae-Sang, Ban, Keun-Do, Yeom, Seung-Jin, Nam, Hyun-Wook, Lee, Dong-Kyu, Jeong, Mun-Mo, Kwak, Byungil, Park, Jeongsoo, Choi, Kisik, Park, Sung-Kye, Kwak, Noh-Jung, Hong, Sung-Joo
Published in 2015 IEEE International Electron Devices Meeting (IEDM) (01.12.2015)
Published in 2015 IEEE International Electron Devices Meeting (IEDM) (01.12.2015)
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Conference Proceeding
Journal Article
Semiconductor device and method for fabricating the same
Hwang, Sun-Hwan, Jeon, Bong-Seok, Park, Ji-Hwan, Lee, Mi-Ri, Jang, Il-Sik, Joung, Yong-Soo
Year of Publication 04.10.2022
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Year of Publication 04.10.2022
Patent
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
HWANG, Sun-Hwan, JOUNG, Yong-Soo, JEON, Bong-Seok, JANG, Il-Sik, PARK, Ji-Hwan, LEE, Mi-Ri
Year of Publication 21.05.2020
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Year of Publication 21.05.2020
Patent
Semiconductor device having buried gate structure and method for fabricating the same
Jang, Tae-Su, Park, Jin-Chul, Park, Ji-Hwan, Ryu, Seong-Wan, Jang, Il-Sik, Ham, Dae-Jin, Kwon, Se-In, Shin, Jung-Ho
Year of Publication 02.02.2021
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Year of Publication 02.02.2021
Patent
Semiconductor device and method for fabricating the same
Hwang, Sun-Hwan, Jeon, Bong-Seok, Park, Ji-Hwan, Lee, Mi-Ri, Jang, Il-Sik, Joung, Yong-Soo
Year of Publication 11.02.2020
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Year of Publication 11.02.2020
Patent
SEMICONDUCTOR DEVICE HAVING BURIED GATE STRUCTURE AND METHOD FOR FABRICATING THE SAME
KWON, Se-In, PARK, Jin-Chul, JANG, Tae-Su, HAM, Dae-Jin, SHIN, Jung-Ho, RYU, Seong-Wan, JANG, Il-Sik, PARK, Ji-Hwan
Year of Publication 31.12.2020
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Year of Publication 31.12.2020
Patent
Semiconductor device having buried gate structure and method for fabricating the same
Jang, Tae-Su, Park, Jin-Chul, Park, Ji-Hwan, Ryu, Seong-Wan, Jang, Il-Sik, Ham, Dae-Jin, Kwon, Se-In, Shin, Jung-Ho
Year of Publication 20.10.2020
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Year of Publication 20.10.2020
Patent
SEMICONDUCTOR DEVICE HAVING BURIED GATE STRUCTURE AND METHOD FOR FABRICATING THE SAME
KWON, Se-In, PARK, Jin-Chul, JANG, Tae-Su, HAM, Dae-Jin, SHIN, Jung-Ho, RYU, Seong-Wan, JANG, Il-Sik, PARK, Ji-Hwan
Year of Publication 08.08.2019
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Year of Publication 08.08.2019
Patent
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
HWANG, Sun-Hwan, JOUNG, Yong-Soo, JEON, Bong-Seok, JANG, Il-Sik, PARK, Ji-Hwan, LEE, Mi-Ri
Year of Publication 21.06.2018
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Year of Publication 21.06.2018
Patent
Semiconductor device having buried gate structure and method for fabricating the same
Jang, Tae-Su, Park, Jin-Chul, Park, Ji-Hwan, Ryu, Seong-Wan, Jang, Il-Sik, Ham, Dae-Jin, Kwon, Se-In, Shin, Jung-Ho
Year of Publication 28.05.2019
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Year of Publication 28.05.2019
Patent
SEMICONDUCTOR DEVICE HAVING BURIED GATE STRUCTURE AND METHOD FOR FABRICATING THE SAME
KWON, Se-In, PARK, Jin-Chul, JANG, Tae-Su, HAM, Dae-Jin, SHIN, Jung-Ho, RYU, Seong-Wan, JANG, Il-Sik, PARK, Ji-Hwan
Year of Publication 21.06.2018
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Year of Publication 21.06.2018
Patent
Semiconductor device and method for fabricating the same
JANG, IL-SIK, LEE, MI-RI, PARK, JI-HWAN, JOUNG, YONG-SOO, HWANG, SUN-HWAN, JEON, BONG-SEOK
Year of Publication 01.07.2023
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Year of Publication 01.07.2023
Patent