Future of plasma etching for microelectronics: Challenges and opportunities
Oehrlein, Gottlieb S., Brandstadter, Stephan M., Bruce, Robert L., Chang, Jane P., DeMott, Jessica C., Donnelly, Vincent M., Dussart, Rémi, Fischer, Andreas, Gottscho, Richard A., Hamaguchi, Satoshi, Honda, Masanobu, Hori, Masaru, Ishikawa, Kenji, Jaloviar, Steven G., Kanarik, Keren J., Karahashi, Kazuhiro, Ko, Akiteru, Kothari, Hiten, Kuboi, Nobuyuki, Kushner, Mark J., Lill, Thorsten, Luan, Pingshan, Mesbah, Ali, Miller, Eric, Nath, Shoubhanik, Ohya, Yoshinobu, Omura, Mitsuhiro, Park, Chanhoon, Poulose, John, Rauf, Shahid, Sekine, Makoto, Smith, Taylor G., Stafford, Nathan, Standaert, Theo, Ventzek, Peter L. G.
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