Ion energy distribution control in single and dual frequency capacitive plasma sources
Lee, J K, Manuilenko, O V, Babaeva, N Yu, Kim, H C, Shon, J W
Published in Plasma sources science & technology (01.02.2005)
Published in Plasma sources science & technology (01.02.2005)
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Journal Article
CPNE7 Induces Biological Dentin Sealing in a Dentin Hypersensitivity Model
Park, S.H., Lee, Y.S., Lee, D.S., Park, J.C., Kim, R., Shon, W.J.
Published in Journal of dental research (01.10.2019)
Published in Journal of dental research (01.10.2019)
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Journal Article
Tertiary Dentin Formation after Indirect Pulp Capping Using Protein CPNE7
Choung, H.W., Lee, D.S., Lee, Ji-Hyun, Shon, W.J., Lee, Jong-Ho, Ku, Y., Park, J.C.
Published in Journal of dental research (01.07.2016)
Published in Journal of dental research (01.07.2016)
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Journal Article
Investigation of anisotropic wafer bending curvature in a-plane GaN films grown on r-plane sapphire substrates
Shon, J.W., Ohta, J., Inoue, S., Kobayashi, A., Fujioka, H.
Published in Journal of crystal growth (15.08.2015)
Published in Journal of crystal growth (15.08.2015)
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Journal Article
Retention of uranium(VI) by laumontite, a fracture-filling material of granite
Baik, M. H., Lee, S. Y., Shon, W. J.
Published in Journal of radioanalytical and nuclear chemistry (01.04.2009)
Published in Journal of radioanalytical and nuclear chemistry (01.04.2009)
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Journal Article
Comparison of line edge roughness and profile angles of chemical vapor deposited amorphous carbon etched in O2/N2/Ar and H2/N2/Ar inductively coupled plasmas
PARK, Y. R, KWON, B. S, JUNG, C. Y, HEO, W, LEE, N.-E, SHON, J. W
Published in Thin solid films (01.08.2011)
Published in Thin solid films (01.08.2011)
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Conference Proceeding
Journal Article
Two-dimensional kinetic and three-dimensional fluid-radiation transport simulations of plasma display panel
YANG, S. S, LEE, J. K, KO, S. W, KIM, H. C, SHON, J. W
Published in Contributions to plasma physics (1985) (2004)
Published in Contributions to plasma physics (1985) (2004)
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Conference Proceeding
Ultrahigh Selective Etching of SiO[sub 2] Using an Amorphous Carbon Mask in Dual-Frequency Capacitively Coupled C[sub 4]F[sub 8]/CH[sub 2]F[sub 2]/O[sub 2]/Ar Plasmas
Kwon, B. S., Kim, J. S., Lee, N.-E., Shon, J. W.
Published in Journal of the Electrochemical Society (2010)
Published in Journal of the Electrochemical Society (2010)
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Journal Article
Comparison of line edge roughness and profile angles of chemical vapor deposited amorphous carbon etched in O 2/N 2/Ar and H 2/N 2/Ar inductively coupled plasmas
Park, Y.R., Kwon, B.S., Jung, C.Y., Heo, W., Lee, N.-E., Shon, J.W.
Published in Thin solid films (01.08.2011)
Published in Thin solid films (01.08.2011)
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Journal Article
A numerical study of the effect of gas injection position in an inductively coupled plasma discharge
Kwon, Deuk Chul, Yoon, N.S., Han, J.H., Shon, J.W.
Published in Current applied physics (01.03.2009)
Published in Current applied physics (01.03.2009)
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Journal Article
Inductively Coupled Plasma Etching of Chemical-Vapor-Deposited Amorphous Carbon in N 2 /O 2 /Ar Chemistries
Lee, Hag Joo, Kwon, Bong Soo, Park, Young Rok, Kim, Jin Sung, Ahn, Joung-ho, Shon, J. W., Lee, Nae-Eung
Published in Japanese Journal of Applied Physics (01.08.2009)
Published in Japanese Journal of Applied Physics (01.08.2009)
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Journal Article
Simulation of capacitively coupled single- and dual-frequency RF discharges
Jae Koo Lee, Babaeva, N.Yu, Hyun Chul Kim, Manuilenko, O.V., Jong Won Shon
Published in IEEE transactions on plasma science (01.02.2004)
Published in IEEE transactions on plasma science (01.02.2004)
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Journal Article
Conference Proceeding
Two-DimensionalKinetic and Three-Dimensional Fluid-Radiation Transport Simulations of Plasma Display Panel
Yang, S. S., Lee, J. K., Ko, S. W., Kim, H. C., Shon, J. W.
Published in Contributions to plasma physics (1988) (01.09.2004)
Published in Contributions to plasma physics (1988) (01.09.2004)
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Journal Article
Modeling Chemical Downstream Etch Systems for NF 3 / O 2 Mixtures
Meeks, E., Larson, R. S., Vosen, S. R., Shon, J. W.
Published in Journal of the Electrochemical Society (01.01.1997)
Published in Journal of the Electrochemical Society (01.01.1997)
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Journal Article
Modeling chemical downstream etch systems for NF3/O2mixtures
MEEKS, E, LARSON, R. S, VOSEN, S. R, SHON, J. W
Published in Journal of the Electrochemical Society (1997)
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Published in Journal of the Electrochemical Society (1997)
Journal Article