Hard Mask Process Using Chemically Amplified 157-nm Resists
Furukawa, Takamitsu, Miyoshi, Seiro, Watanabe, Hiroyuki, Irie, Sigeo, Itani, Toshiro
Published in Journal of Photopolymer Science and Technology (01.01.2002)
Published in Journal of Photopolymer Science and Technology (01.01.2002)
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