Theoretical estimation of absorption coefficients of various polymers at 13 nm
Matsuzawa, Nobuyuki N., Oizumi, Hiroaki, Mori, Shigeyasu, Irie, Shigeo, Yano, Ei, Okazaki, Shinji, Ishitani, Akihiko
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
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Journal Article
Characterization of Fluoropolymer Resist for 157-nm Lithography
Hagiwara, Takuya, Irie, Shigeo, Itani, Toshiro, Kawaguchi, Yasuhide, Yokokoji, Osamu, Kodama, Shun-ichi
Published in Journal of Photopolymer Science and Technology (01.01.2003)
Published in Journal of Photopolymer Science and Technology (01.01.2003)
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Journal Article
Theoretical Calculation of Photoabsorption of Various Polymers in an Extreme Ultraviolet Region
Matsuzawa, Nobuyuki N., Oizumi, Hiroaki, Mori, Shigeyasu, Irie, Shigeo, Shirayone, Shigeru, Yano, Ei, Okazaki, Shinji, Ishitani, Akihiko, Dixon, David A.
Published in Japanese Journal of Applied Physics (01.12.1999)
Published in Japanese Journal of Applied Physics (01.12.1999)
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Journal Article
Measurement of Resist Transmittance at Extreme Ultraviolet Wavelength Using the Extreme Ultraviolet Reflectometer
Irie, Shigeo, Endo, Masayuki, Sasago, Masaru, Kandaka, Noriaki, Kondo, Hiroyuki, Murakami, Katsuhiko
Published in Japanese Journal of Applied Physics (2002)
Published in Japanese Journal of Applied Physics (2002)
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Journal Article
157-nm Single-Layer Resists Based on Main-Chain-Fluorinated Polymers
Irie, Shigeo, Ishikawa, Seiichi, Hagiwara, Takuya, Yamazaki, Tamio, Furukawa, Takamitsu, Itani, Toshiro, Kawaguchi, Yasuhide, Kodama, Syun-ichi, Yokokoji, Osamu, Kaneko, Isamu, Takebe, Yoko, Okada, Shinji
Published in Japanese Journal of Applied Physics (2003)
Published in Japanese Journal of Applied Physics (2003)
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Journal Article
Study of Transmittance of Polymers and Influence of Photoacid Generator on Resist Transmittance at Extreme Ultraviolet Wavelength
Irie, Shigeo, Endo, Masayuki, Sasago, Masaru, Kandaka, Noriaki, Kondo, Hiroyuki, Murakami, Katsuhiko
Published in Japanese Journal of Applied Physics (2002)
Published in Japanese Journal of Applied Physics (2002)
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Journal Article
A New Monocyclic Fluoropolymer for 157-nm Photoresists
Sasaki, Takashi, Takebe, Yoko, eda, Masataka, Yokokoji, Osamu, Irie, Shigeo, Otoguro, Akihito, Fujii, Kiyoshi, Itani, Toshio
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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Journal Article
포토 마스크 블랭크, 포토 마스크의 제조 방법 및 마스크 패턴 형성 방법
INAZUKI YUKIO, IRIE SHIGEO, YOSHII TAKASHI, KANEKO HIDEO, MASUNAGA KEIICHI, SAKURADA TOYOHISA
Year of Publication 01.11.2017
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Year of Publication 01.11.2017
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