UV, X-RAY AND E-BEAM SENSITIVE PLASMA POLYMERLIZED RESISTS
Takenouchi, H., Senda, K., Uchida, T., Inanami, R., Vinogradov, G.K., Morita, Shinzo
Published in Journal of Photopolymer Science and Technology (1995)
Published in Journal of Photopolymer Science and Technology (1995)
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Journal Article
Throughput enhancement strategy of maskless electron beam direct writing for logic device
Inanami, R., Magoshi, S., Kousai, S., Hmada, M., Takayanagi, T., Sugihara, K., Okumura, K., Kuroda, T.
Published in International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) (2000)
Published in International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) (2000)
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Conference Proceeding
A study of line edge roughness in chemically amplified resist for low energy electron-beam lithography
Nakasugi, T., Ando, A., Inanami, R., Sasaki, N., Sugihara, K.
Published in Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) (2001)
Published in Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) (2001)
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Conference Proceeding
Uv, x-ray and e-beam sensitive plasma polymerlized resists
Takenouchi, H., Senda, K., Uchida, T., Inanami, R., Vinogradov, G.K., Morita, Shinzo
Published in Journal of photopolymer science and technology (1995)
Published in Journal of photopolymer science and technology (1995)
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Journal Article
Polyimide transmitted E-beam excited CF4 plasma etching
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Conference Proceeding
Journal Article
A character size optimization technique for throughput enhancement of character projection lithography
Sugihara, M., Takata, T., Nakamura, K., Inanami, Rx, Inanami, R., Hayashi, H., Kishimoto, K., Hasebe, T., Kawano, Y., Matsunaga, Y., Murakami, K., Okumura, K.
Published in 2006 IEEE International Symposium on Circuits and Systems (ISCAS) (2006)
Published in 2006 IEEE International Symposium on Circuits and Systems (ISCAS) (2006)
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Conference Proceeding
Edge Roughness Study of Chemically Amplified Resist in Low-Energy Electron-Beam Lithography Using Computer Simulation
Nakasugi, Tetsuro, Ando, Atsushi, Inanami, Ryoichi, Sasaki, Noriaki, Sugihara, Kazuyoshi, Miyoshi, Motosuke, Fujioka, Hiromu
Published in Japanese Journal of Applied Physics (2002)
Published in Japanese Journal of Applied Physics (2002)
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Journal Article
Silicon Wafer Etching by Transmitted Electron‐Beam‐Enhanced Plasma
Inanami, Ryoichi, Shao, Chunlin, Morita, Sinzo
Published in Journal of the Electrochemical Society (01.09.1994)
Published in Journal of the Electrochemical Society (01.09.1994)
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Journal Article
Synchrotron-radiation-induced deposition of etch-proctecting film on Si in CF4 plasma
SHAO, C, MORITA, S, SOGA, T, INANAMI, R, HATTORI, S
Published in Japanese journal of applied physics (1996)
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Published in Japanese journal of applied physics (1996)
Journal Article
50 nm pattern etching of Si wafer by synchrotron radiation excited CF4 plasma
INANAMI, R, YAMADA, T, OHSAKI, S, OGAWA, S, MORITA, S
Published in Japanese journal of applied physics (01.12.1997)
Published in Japanese journal of applied physics (01.12.1997)
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Conference Proceeding
Lithography Simulator for Electon Beam/Deep UV Intra-Level Mix & Match
Ryoichi Inanami, Ryoichi Inanami, Tetsuro Nakasugi, Tetsuro Nakasugi, Shinji Sato, Shinji Sato, Shoji Mimotogi, Shoji Mimotogi, Satoshi Tanaka, Satoshi Tanaka, Kazuyoshi Sugihara, Kazuyoshi Sugihara
Published in Japanese Journal of Applied Physics (1999)
Published in Japanese Journal of Applied Physics (1999)
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Journal Article
Cell Library Development Methodology for Throughput Enhancement of Electron Beam Direct-Write Lithography Systems
Sugihara, M., Takata, T., Nakamura, K., Inanami, R., Hayashi, H., Kishimoto, K., Hasebe, T., Kawano, Y., Matsunaga, Y., Murakami, K., Okumura, K.
Published in 2005 International Symposium on System-on-Chip (2005)
Published in 2005 International Symposium on System-on-Chip (2005)
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Conference Proceeding
Lithography simulator for EB/DUV intra-level mix and match
Inanami, R., Nakasugi, T., Sato, S., Mimotogi, S., Tanaka, S., Sugihara, K.
Published in Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference (1999)
Published in Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference (1999)
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Conference Proceeding