Electromigration in AlCu lines: comparison of Dual Damascene and metal reactive ion etching
Filippi, R.G, Gribelyuk, M.A, Joseph, T, Kane, T, Sullivan, T.D, Clevenger, L.A, Costrini, G, Gambino, J, Iggulden, R.C, Kiewra, E.W, Ning, X.J, Ravikumar, R, Schnabel, R.F, Stojakovic, G, Weber, S.J, Gignac, L.M, Hu, C.-K, Rath, D.L, Rodbell, K.P
Published in Thin solid films (01.06.2001)
Published in Thin solid films (01.06.2001)
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Journal Article
Temperature dependence of the Al-fill processes for submicron-via structures
Weber, S.J, Iggulden, R.C, Schnabel, R.F, Weigand, P, Restaino, D.D, Brodsky, S.B, Mehter, E.A, Clevenger, L.A
Published in Thin solid films (04.05.1998)
Published in Thin solid films (04.05.1998)
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Journal Article
Conference Proceeding
Aluminum dual damascene metallization for 0.175 μm DRAM generations and beyond ( invited)
Schnabel, R.F, Clevenger, L.A, Costrini, G, Dobuzinsky, D.M, Filippi, R, Gambino, J, Lee, G.Y, Iggulden, R.C, Lin, C, Lu, Z.G, Ning, X.J, Ramachandran, R, Ronay, M, Többen, D, Weber, S.J
Published in Microelectronic engineering (2000)
Published in Microelectronic engineering (2000)
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Journal Article
Conference Proceeding
Challenges of aluminum RIE technology at sub 0.45 /spl mu/m pitches [DRAM interconnects]
Ravikumar, R., Filippi, R.G., Iggulden, R.C., Kiewra, E.W., Kirihata, T., Kitahara, H., Lee, G.Y., Liegl, B., Matsunaga, T., Ning, X.J., Rath, D.L., Stojakovic, G., Weber, S.J.
Published in Proceedings of the IEEE 1999 International Interconnect Technology Conference (Cat. No.99EX247) (1999)
Published in Proceedings of the IEEE 1999 International Interconnect Technology Conference (Cat. No.99EX247) (1999)
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Conference Proceeding
A novel low temperature CVD/PVD Al filling process for producing highly reliable 0.175 /spl mu/m wiring/0.35 /spl mu/m pitch dual damascene interconnections in gigabit scale DRAMs
Clevenger, L.A., Costrini, G., Dobuzinsky, D.M., Filippi, R., Gambino, J., Hoinkis, M., Gignac, L., Hurd, J.L., Iggulden, R.C., Lin, C., Longo, R., Lu, G.Z., Ning, J., Nuetzel, J.F., Ploessl, R., Rodbell, K., Ronay, M., Schnabel, R.F., Tobben, D., Weber, S.J., Chen, L., Chiang, S., Gou, T., Mosely, R., Voss, S., Yang, L.
Published in Proceedings of the IEEE 1998 International Interconnect Technology Conference (Cat. No.98EX102) (1998)
Published in Proceedings of the IEEE 1998 International Interconnect Technology Conference (Cat. No.98EX102) (1998)
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Conference Proceeding