(Invited) The Past, Present and Future of High-k/Metal Gates
Choi, Kisik, Ando, Takashi, Cartier, Eduard A., Kerber, Andreas, Paruchuri, Vamsi, Iacoponi, John, Narayanan, Vijay
Published in ECS transactions (03.05.2013)
Published in ECS transactions (03.05.2013)
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Novel Approach to Reduce Source/Drain Series and Contact Resistance in High-Performance UTSOI CMOS Devices Using Selective Electrodeless CoWP or CoB Process
Pan, J., Topol, A., Shao, I., Chun-Yung Sung, Iacoponi, J., Ming-Ren Lin
Published in IEEE electron device letters (01.08.2007)
Published in IEEE electron device letters (01.08.2007)
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Process Technology - Interconnects and 3D IC's
Published in 2006 International Electron Devices Meeting
(01.12.2006)
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Conference Proceeding
Semiconductor device configured for avoiding electrical shorting
Xie, Ruilong, Taylor, Jr., William James, Iacoponi, John A, Kim, Ryan Ryoung-han, Park, Chanro
Year of Publication 14.08.2018
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Year of Publication 14.08.2018
Patent
(Invited) The Past, Present and Future of High-k/Metal Gates
Choi, Kisik, Ando, Takashi, Cartier, Eduard A., Kerber, Andreas, Paruchuri, Vamsi, Iacoponi, John, Narayanan, Vijay
Published in Meeting abstracts (Electrochemical Society) (08.03.2013)
Published in Meeting abstracts (Electrochemical Society) (08.03.2013)
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Journal Article