Nucleation and growth of nanocrystalline silicon studied by TEM, XPS and ESR
Sato, Keisuke, Izumi, Tomio, Iwase, Mitsuo, Show, Yoshiyuki, Morisaki, Hiroshi, Yaguchi, Toshie, Kamino, Takeo
Published in Applied surface science (30.06.2003)
Published in Applied surface science (30.06.2003)
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Thermal characterization of CVD diamond film by photoacoustic method
Takabatake, Nobuya, Kobayashi, Takeshi, Sekine, Daisuke, Izumi, Tomio
Published in Applied surface science (01.06.2000)
Published in Applied surface science (01.06.2000)
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METHOD FOR KEEPING QUALITY OF FRUIT AND VEGETABLE
HIRUMA NAOYA, IZUMI TOMIO, NAKAZAKI TETSUYA, NAKANO RYUHEI, TAKISAWA RIHITO
Year of Publication 10.11.2022
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Year of Publication 10.11.2022
Patent
Structural changes in CVD diamond film by boron and nitrogen doping
Show, Yoshiyuki, Matsukawa, Toshikazu, Ito, Hirokazu, Iwase, Mitsuo, Izumi, Tomio
Published in Diamond and related materials (01.04.2000)
Published in Diamond and related materials (01.04.2000)
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Characterization of surface conductive diamond layer grown by microwave plasma chemical vapor deposition
MORI, Y, SHOW, Y, ITO, T, HIRAO, T, IZUMI, T, SASAKI, T, HIRAKI, A, DEGUCHI, M, YAGI, H, YAGYU, H, EIMORI, N, OKADA, T, HATTA, A, NISHIMURA, K, KITABATAKE, M
Published in Japanese Journal of Applied Physics (1993)
Published in Japanese Journal of Applied Physics (1993)
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Journal Article
Structural properties of silicon oxide films prepared by the RF substrate biased ECR plasma CVD method
KITAGAWA, M, HIRAO, T, OHMURA, T, IZUMI, T
Published in Japanese Journal of Applied Physics (01.06.1989)
Published in Japanese Journal of Applied Physics (01.06.1989)
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Journal Article
Synthesis of β-SiC layer in silicon by carbon ion hot implantation
DEGUCHI, M, KITABATAKE, M, HIRAO, T, ARAI, N, IZUMI, T
Published in Japanese Journal of Applied Physics (01.02.1992)
Published in Japanese Journal of Applied Physics (01.02.1992)
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Journal Article
Influence of deposition conditions on the properties of silicon nitride films prepared by the ECR plasma CVD method
HIRAO, T, SETSUNE, K, KITAGAWA, M, KAMADA, T, WASA, K, IZUMI, T
Published in Japanese Journal of Applied Physics (01.12.1987)
Published in Japanese Journal of Applied Physics (01.12.1987)
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Journal Article
Properties of silicon oxynitride films prepared by ECR plasma CVD method
HIRAO, T, SETSUNE, K, KITAGAWA, M, KAMADA, T, OHMURA, T, WASA, K, IZUMI, T
Published in Japanese Journal of Applied Physics (1988)
Published in Japanese Journal of Applied Physics (1988)
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Journal Article
Development of triode type RF plasma enhanced CVD equipment for low temperature growth of carbon nanotube
Show, Yoshiyuki, Yabe, Yutaka, Izumi, Tomio, Yamauchi, Hidehiko
Published in Diamond and related materials (01.11.2005)
Published in Diamond and related materials (01.11.2005)
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Journal Article
Conference Proceeding
Relationship between Electron Emission from the Surface of CVD Diamond Films and Defects Density
AKIBA, Yukio, HIROSE, Yoichi, KUROSU, Tateki, IIDA, Masamori, SHOW, Yoshiyuki, IZUMI, Tomio
Published in Hyōmen gijutsu (01.07.1995)
Published in Hyōmen gijutsu (01.07.1995)
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Journal Article
Photoacoustic evaluation of defects and thermal conductivity in the surface layer of ion implanted semiconductors
Takabatake, Nobuya, Kobayashi, Takeshi, Show, Yoshiyuki, Izumi, Tomio
Published in Materials science & engineering. B, Solid-state materials for advanced technology (30.04.2002)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (30.04.2002)
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Journal Article
Conference Proceeding