Theoretical evaluation of thermal decomposition of dichlorosilane for plasma-enhanced atomic layer deposition of silicon nitride: the important role of surface hydrogen
Hartmann, Gregory, Ventzek, Peter L G, Iwao, Toshihiko, Ishibashi, Kiyotaka, Hwang, Gyeong S
Published in Physical chemistry chemical physics : PCCP (2018)
Published in Physical chemistry chemical physics : PCCP (2018)
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Ammonium chloride (–NH3+Cl-) salt formation from dichlorosilane decomposition and its potential impact on silicon nitride atomic layer deposition
Yang, Tsung-Hsuan, Cheng, Erik S., Johnson, Samuel M., Iwao, Toshihiko, Zhao, Jianping, Ekerdt, John G., L. G. Ventzek, Peter, Hwang, Gyeong S.
Published in Applied surface science (30.08.2023)
Published in Applied surface science (30.08.2023)
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