Search Results - "IWAMOTO Hayato" :: K.UTB vyhledávací portál

$IR sensitivity enhancement of CMOS Image Sensor with diffractive light trapping pixels$

IR sensitivity enhancement of CMOS Image Sensor with diffractive light trapping pixels

by Yokogawa, Sozo, Oshiyama, Itaru, Ikeda, Harumi, Ebiko, Yoshiki, Hirano, Tomoyuki, Saito, Suguru, Oinoue, Takashi, Hagimoto, Yoshiya, Iwamoto, Hayato
Published in Scientific reports (19.06.2017)

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Structural and electrical characteristics of ion-induced Si damage during atomic layer etching

by Hirata, Akiko, Fukasawa, Masanaga, Kugimiya, Katsuhisa, Karahashi, Kazuhiro, Hamaguchi, Satoshi, Hagimoto, Yoshiya, Iwamoto, Hayato
Published in Japanese Journal of Applied Physics (01.07.2022)

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High-throughput SiN ALE: surface reaction and ion-induced damage generation mechanisms

by Hirata, Akiko, Fukasawa, Masanaga, Tercero, Jomar Unico, Kugimiya, Katsuhisa, Hagimoto, Yoshiya, Karahashi, Kazuhiro, Hamaguchi, Satoshi, Iwamoto, Hayato
Published in Japanese Journal of Applied Physics (01.07.2023)

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Development of face-to-face and face-to-back ultra-fine pitch Cu-Cu hybrid bonding

by Kagawa, Yoshihisa, Kamibayashi, Takumi, Yamano, Yuriko, Nishio, Kenya, Sakamoto, Akihisa, Yamada, Taichi, Shimizu, Kan, Hirano, Tomoyuki, Iwamoto, Hayato
Published in 2022 IEEE 72nd Electronic Components and Technology Conference (ECTC) (01.01.2022)

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$Band-Edge High-Performance Metal-Gate/High- \kappa nMOSFET Using \hbox\hbox/\hbox Stack$

Band-Edge High-Performance Metal-Gate/High- \kappa nMOSFET Using \hbox\hbox/\hbox Stack

by Ando, T., Hirano, T., Tai, K., Yamaguchi, S., Yoshida, S., Iwamoto, H., Kadomura, S., Watanabe, H.
Published in IEEE transactions on electron devices (01.12.2009)

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Atmospheric In situ Arsenic-Doped SiGe Selective Epitaxial Growth for Raised-Extension N-type Metal–Oxide–Semiconductor Field-Effect Transistor

by Ikuta, Tetsuya, Miyanami, Yuki, Fujita, Shigeru, Iwamoto, Hayato, Kadomura, Shingo, Shimura, Takayoshi, Watanabe, Heiji, Yasutake, Kiyoshi
Published in Japanese Journal of Applied Physics (01.04.2007)

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Effect of Post-Etch Wet Cleaning on GaAs Surfaces

by Hirano, Tomoki, Saito, Suguru, Iwamoto, Hayato, Hagimoto, Yoshiya
Published in Solid state phenomena (14.08.2023)

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Heavy arsenic doping of silicon grown by atmospheric pressure selective epitaxial chemical vapor deposition

by Ikuta, Tetsuya, Miyanami, Yuki, Fujita, Shigeru, Iwamoto, Hayato, Kadomura, Shingo, Shimura, Takayoshi, Watanabe, Heiji, Yasutake, Kiyoshi
Published in Science and technology of advanced materials (01.01.2007)

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Threshold Voltage Modulation Technique using Fluorine Treatment through Atomic Layer Deposition TiN Suitable for Complementary Metal–Oxide–Semiconductor Devices

by Tai, Kaori, Yamaguchi, Shinpei, Tanaka, Kazuki, Hirano, Tomoyuki, Oshiyama, Itaru, Kazi, Salam, Ando, Takashi, Nakata, Masashi, Yamanaka, Mayumi, Yamamoto, Ryo, Kanda, Sayuri, Tateshita, Yasushi, Wakabayashi, Hitoshi, Tagawa, Yukio, Tukamoto, Masanori, Iwamoto, Hayato, Saito, Masaki, Nagashima, Naoki, Kadomura, Shingo
Published in Japanese Journal of Applied Physics (01.04.2008)

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Modeling and simulation of coverage and film properties in deposition process on large-scale pattern using statistical ensemble method

by Kuboi, Nobuyuki, Matsugai, Hiroyasu, Tatsumi, Tetsuya, Kobayashi, Shoji, Hagimoto, Yoshiya, Iwamoto, Hayato
Published in Japanese Journal of Applied Physics (01.07.2023)

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(Invited) Bonding Strength of Cu-Cu Hybrid Bonding for 3D Integration Process

by Fujii, Nobutoshi, Furuse, Shunsuke, Yoshioka, Hirotaka, Ogawa, Naoki, Yamada, Taichi, Hirano, Takaaki, Saito, Suguru, Hagimoto, Yoshiya, Iwamoto, Hayato
Published in ECS transactions (29.09.2023)

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Five-step plasma-enhanced atomic layer etching of silicon nitride with a stable etched amount per cycle

by Hirata, Akiko, Fukasawa, Masanaga, Tercero, Jomar U., Kugimiya, Katsuhisa, Hagimoto, Yoshiya, Karahashi, Kazuhiro, Hamaguchi, Satoshi, Iwamoto, Hayato
Published in Japanese Journal of Applied Physics (01.06.2022)

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8.3 M-Pixel 480-fps Global-Shutter CMOS Image Sensor with Gain-Adaptive Column ADCs and Chip-on-Chip Stacked Integration

by Oike, Yusuke, Akiyama, Kentaro, Hung, Luong D., Niitsuma, Wataru, Kato, Akihiko, Sato, Mamoru, Kato, Yuri, Nakamura, Wataru, Shiroshita, Hiroshi, Sakano, Yorito, Kitano, Yoshiaki, Nakamura, Takuya, Toyama, Takayuki, Iwamoto, Hayato, Ezaki, Takayuki
Published in IEEE journal of solid-state circuits (01.04.2017)

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Characterization of Wet Chemical Atomic Layer Etching of InGaAs

by Hirano, Tomoki, Fukatani, Takashi, Saito, Suguru, Iwamoto, Hayato, Nishio, Kenya, Hagimoto, Yoshiya
Published in Solid state phenomena (01.02.2021)

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Analysis of Surface Reaction for Group III-V Compound Semiconductors in Functional Water

by Nishio, Kenya, Hagimoto, Yoshiya, Oinoue, Takashi, Saito, Suguru, Ida, Junichi, Iwamoto, Hayato, Ogawa, Yuichi
Published in Solid state phenomena (01.02.2021)

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