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"IWAHASHI, Yasutomi"
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"IWAHASHI, Yasutomi"
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SILICA GLASS FOR HIGH-FREQUENCY DEVICES, AND HIGH-FREQUENCY DEVICE
by
SASAKI, Kazuya
,
KIDERA, Nobutaka
,
IWAHASHI
,
Yasutomi
Year of Publication
16.05.2019
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BLANK FOR NANOIMPRINT MOLD, NANOIMPRINT MOLD, AND METHODS FOR PRODUCING SAID BLANK AND SAID NANOIMPRINT MOLD
by
IWAHASHI YASUTOMI
,
HAYASHI KAZUYUKI
,
MAESHIGE KAZUNOBU
Year of Publication
07.10.2014
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BLANK FOR NANOIMPRINT MOLD, NANOIMPRINT MOLD, AND METHODS FOR PRODUCING SAID BLANK AND SAID NANOIMPRINT MOLD
by
IWAHASHI YASUTOMI
,
HAYASHI KAZUYUKI
,
MAESHIGE KAZUNOBU
Year of Publication
01.08.2013
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TIO2-CONTAINING SILICA GLASS, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY
by
KIKUGAWA SHINYA
,
IWAHASHI YASUTOMI
,
KOIKE AKIO
Year of Publication
31.05.2012
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TIO2-CONTAINING SILICA GLASS, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY
by
KIKUGAWA SHINYA
,
IWAHASHI YASUTOMI
,
KOIKE AKIO
Year of Publication
24.02.2011
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ArF-LITHOGRAPHY MIRROR AND ArF-LITHOGRAPHY OPTICAL MEMBER
by
OGAWA TOMONORI
,
IWAHASHI YASUTOMI
,
KOIKE AKIO
Year of Publication
06.01.2011
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PROCESS FOR PRODUCING POROUS QUARTZ GLASS OBJECT, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY
by
IWAHASHI YASUTOMI
,
KOIKE AKIO
,
MITSUMORI TAKAHIRO
Year of Publication
18.11.2010
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TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME
by
KIKUGAWA SHINYA
,
IWAHASHI YASUTOMI
,
KOIKE AKIO
Year of Publication
04.11.2010
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TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME
by
KIKUGAWA SHINYA
,
IWAHASHI YASUTOMI
,
KOIKE AKIO
Year of Publication
01.11.2010
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TIO2-CONTAINING SILICA GLASS
by
KIKUGAWA SHINYA
,
IWAHASHI YASUTOMI
,
KOIKE AKIO
Year of Publication
10.09.2010
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PROCESS FOR PRODUCING POROUS QUARTZ GLASS OBJECT, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY
by
IWAHASHI YASUTOMI
,
KOIKE AKIO
,
MITSUMORI TAKAHIRO
Year of Publication
02.09.2010
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TIO2-CONTAINING QUARTZ GLASS SUBSTRATE
by
OKAMURA KENJI
,
IWAHASHI YASUTOMI
,
IKUTA YOSHIAKI
Year of Publication
03.06.2010
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METHOD FOR PRODUCING TiO2-SiO2 GLASS BODY, METHOD FOR HEAT-TREATING TiO2-SiO2 GLASS BODY, TiO2-SiO2 GLASS BODY, AND OPTICAL BASE FOR EUVL
by
OGAWA TOMONORI
,
IWAHASHI YASUTOMI
,
KOIKE AKIO
,
MITSUMORI TAKAHIRO
Year of Publication
28.03.2012
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METHOD FOR PRODUCING TiO2-SiO2 GLASS BODY, METHOD FOR HEAT-TREATING TiO2-SiO2 GLASS BODY, TiO2-SiO2 GLASS BODY, AND OPTICAL BASE FOR EUVL
by
OGAWA TOMONORI
,
IWAHASHI YASUTOMI
,
KOIKE AKIO
,
MITSUMORI TAKAHIRO
Year of Publication
07.03.2012
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Silica glass for radio-frequency device and radio-frequency device technical field
by
Iwahashi
,
Yasutomi
,
Sasaki, Kazuya
,
Kidera, Nobutaka
Year of Publication
27.02.2024
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TiO2-CONTAINING QUARTZ GLASS SUBSTRATE
by
OKAMURA, KENJI
,
IWAHASHI
,
YASUTOMI
,
IKUTA, YOSHIAKI
Year of Publication
19.03.2009
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METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL
by
OGAWA TOMONORI
,
IWAHASHI YASUTOMI
,
KOIKE AKIO
,
MITSUMORI TAKAHIRO
Year of Publication
25.11.2010
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TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING THE SAME
by
KIKUGAWA SHINYA
,
TACHIBANA YUKO
,
IWAHASHI YASUTOMI
,
KOIKE AKIO
Year of Publication
25.11.2010
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METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL
by
OGAWA TOMONORI
,
IWAHASHI YASUTOMI
,
KOIKE AKIO
,
MITSUMORI TAKAHIRO
Year of Publication
18.11.2010
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TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING HIGH ENERGY DENSITIES AS WELL AS SPECIAL TEMPERATURE CONTROLLED PROCESS FOR ITS MANUFACTURE
by
KIKUGAWA SHINYA
,
SHAO LONG
,
SAITO KENTA
,
IWAHASHI YASUTOMI
,
KOIKE AKIO
Year of Publication
01.11.2010
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