Crystal morphology of spherical silicon particles produced by jet-splitting method
Kuzuoka, Yoshikazu, Isomae, Seiichi, Yamaguchi, Yukio
Published in Journal of crystal growth (15.06.2007)
Published in Journal of crystal growth (15.06.2007)
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Intrinsic gettering of copper in silicon wafers
ISOMAE, Seiichi, ISHIDA, Hidetsugu, ITOGA, Toshihiko, HOZAWA, Kazuyuki
Published in Journal of the Electrochemical Society (01.06.2002)
Published in Journal of the Electrochemical Society (01.06.2002)
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Simultaneous Measurement of Size and Depth of Each Defect in a Silicon Wafer Using Light Scattering at Two Wavelengths: Principle, Limitation and Applications of Optical Shallow Defect Analyzer
Takeda, Kazuo, Isomae, Seiichi, Maeshima, MakotoOhkura, ShigeruMatsui, ShigeruMatsui
Published in Japanese Journal of Applied Physics (01.06.1999)
Published in Japanese Journal of Applied Physics (01.06.1999)
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New Technique to Determine Gettering Efficiency of Heavy Metals and Its Application to Carbon-Ion-Implanted Si Epitaxial Wafers
Itoga, Toshihiko, Hozawa, Kazuyuki, Takeda, Kazuo, Isomae, Seiichi, Ohkura, Makoto
Published in Japanese Journal of Applied Physics (01.04.2001)
Published in Japanese Journal of Applied Physics (01.04.2001)
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Excellence of gate oxide integrity in metal-oxide-semiconductor large-scale-integrated circuits based on P-/P- thin-film epitaxial silicon wafers
SHIMIZU, H, SUGINO, Y, SUZUKI, N, KIYOTA, S, NAGASAWA, K, FUJITA, M, TAKEDA, K, ISOMAE, S
Published in Japanese Journal of Applied Physics (01.05.1997)
Published in Japanese Journal of Applied Physics (01.05.1997)
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Stress effect on current-induced degradation of Be-doped AlGaAs/GaAs heterojunction bipolar transistors
MOCHIZUKI, K, ISOMAE, S, MASUDA, H, TANOUE, T, KUSANO, C
Published in Japanese Journal of Applied Physics (01.03.1992)
Published in Japanese Journal of Applied Physics (01.03.1992)
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Development of OXSIM2D: A Simulation Program of SiO2 Growth and Stress Generation in Thermal Oxidation Process of Silicon
SAITO, Naoto, SAKATA, Shinji, IKEGAWA, Masahiro, MIURA, Hideo, OHTA, Hiroyuki, SHIMIZU, Tasuku, ISOMAE, Seiichi, MASUDA, Hiroo
Published in Transactions of the Japan Society of Mechanical Engineers Series A (1991)
Published in Transactions of the Japan Society of Mechanical Engineers Series A (1991)
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Copper Distribution near a SiO 2 /Si Interface under Low-Temperature Annealing
Hozawa, Kazuyuki, Isomae, Seiichi, Yugami, Jiro
Published in Japanese Journal of Applied Physics (15.10.2002)
Published in Japanese Journal of Applied Physics (15.10.2002)
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