Sample environment at the J-PARC MLF
Ohira-Kawamura, S., Oku, T., Watanabe, M., Takahashi, R., Munakata, K., Takata, S., Sakaguchi, Y., Ishikado, M., Ohuchi, K., Hattori, T., Kira, H., Sakai, K., Aso, T., Yamauchi, Y., Isomae, S.
Published in Journal of neutron research (01.01.2017)
Published in Journal of neutron research (01.01.2017)
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Journal Article
A New Two-Dimensional Silicon Oxidation Model
Isomae, S., Yamamoto, S.
Published in IEEE transactions on computer-aided design of integrated circuits and systems (01.05.1987)
Published in IEEE transactions on computer-aided design of integrated circuits and systems (01.05.1987)
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Journal Article
Evaluation of dislocation generation on silicon substrates by selective oxidation
TAMAKI, Y, ISOMAE, S, MIZUO, S, HIGUCHI, H
Published in Journal of the Electrochemical Society (01.11.1983)
Published in Journal of the Electrochemical Society (01.11.1983)
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Journal Article
Oxidation-induced stress in a LOCOS structure
Isomae, S., Yamamoto, S., Aoki, S., Yajima, A.
Published in IEEE electron device letters (01.06.1986)
Published in IEEE electron device letters (01.06.1986)
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Journal Article
Evaluation of Dislocation Generation at Si3 N 4 Film Edges on Silicon Substrates by Selective Oxidation
Tamaki, Y., Isomae, S., Mizuo, S., Higuchi, H.
Published in Journal of the Electrochemical Society (01.03.1981)
Published in Journal of the Electrochemical Society (01.03.1981)
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Journal Article
Dislocation Generation at Si3 N 4 Film Edges on Silicon Substrates and Viscoelastic Behavior of SiO2 Films
Isomae, S., Tamaki, Y., Yajima, A., Nanba, M., Maki, M.
Published in Journal of the Electrochemical Society (01.06.1979)
Published in Journal of the Electrochemical Society (01.06.1979)
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Journal Article
Intrinsic gettering of copper in silicon wafers
ISOMAE, Seiichi, ISHIDA, Hidetsugu, ITOGA, Toshihiko, HOZAWA, Kazuyuki
Published in Journal of the Electrochemical Society (01.06.2002)
Published in Journal of the Electrochemical Society (01.06.2002)
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Journal Article
New Technique to Determine Gettering Efficiency of Heavy Metals and Its Application to Carbon-Ion-Implanted Si Epitaxial Wafers
Itoga, Toshihiko, Hozawa, Kazuyuki, Takeda, Kazuo, Isomae, Seiichi, Ohkura, Makoto
Published in Japanese Journal of Applied Physics (01.04.2001)
Published in Japanese Journal of Applied Physics (01.04.2001)
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Journal Article
Simultaneous Measurement of Size and Depth of Each Defect in a Silicon Wafer Using Light Scattering at Two Wavelengths: Principle, Limitation and Applications of Optical Shallow Defect Analyzer
Takeda, Kazuo, Isomae, Seiichi, Maeshima, MakotoOhkura, ShigeruMatsui, ShigeruMatsui
Published in Japanese Journal of Applied Physics (01.06.1999)
Published in Japanese Journal of Applied Physics (01.06.1999)
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Journal Article
Excellence of gate oxide integrity in metal-oxide-semiconductor large-scale-integrated circuits based on P-/P- thin-film epitaxial silicon wafers
SHIMIZU, H, SUGINO, Y, SUZUKI, N, KIYOTA, S, NAGASAWA, K, FUJITA, M, TAKEDA, K, ISOMAE, S
Published in Japanese Journal of Applied Physics (01.05.1997)
Published in Japanese Journal of Applied Physics (01.05.1997)
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Journal Article
Stress effect on current-induced degradation of Be-doped AlGaAs/GaAs heterojunction bipolar transistors
MOCHIZUKI, K, ISOMAE, S, MASUDA, H, TANOUE, T, KUSANO, C
Published in Japanese Journal of Applied Physics (01.03.1992)
Published in Japanese Journal of Applied Physics (01.03.1992)
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Journal Article
Evaluation of dislocation generation in U-groove isolation
TAMAKI, Y, ISOMAE, S, SAGARA, K, KURE, T, KAWAMURA, M
Published in Journal of the Electrochemical Society (01.03.1988)
Published in Journal of the Electrochemical Society (01.03.1988)
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Journal Article
Copper distribution behavior near a SiO/sub 2//Si interface by low-temperature (<400/spl deg/C) annealing and its influence on electrical characteristics of MOS-capacitors
Hozawa, K., Itoga, T., Isomae, S., Yugami, J., Ohkura, M.
Published in 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104) (2000)
Published in 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104) (2000)
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