Mechanism of wiggling enhancement due to HBr gas addition during amorphous carbon etching
Kofuji, Naoyuki, Ishimura, Hiroaki, Kobayashi, Hitoshi, Une, Satoshi
Published in Japanese Journal of Applied Physics (01.06.2015)
Published in Japanese Journal of Applied Physics (01.06.2015)
Get full text
Journal Article
PLASMA PROCESSING METHOD
ISHIMURA HIROAKI, ITO TORU, ISHIHARA MASUNORI, NISHIDA TOSHIAKI, KAWAMOTO NAOHIRO
Year of Publication 16.03.2015
Get full text
Year of Publication 16.03.2015
Patent
PLASMA PROCESSING METHOD
ISHIMURA HIROAKI, OHMORI TAKESHI, SAKAGUCHI MASAMICHI, NISHIMORI YASUHIRO, KOBAYASHI HITOSHI
Year of Publication 30.05.2012
Get full text
Year of Publication 30.05.2012
Patent
DRY ETCHING METHOD
ISHIMURA HIROAKI, ITO TORU, ISHIHARA MASUNORI, INOUE YOSHIHARU, KOBAYASHI HITOSHI, ISHIDA TOSHIAKI
Year of Publication 11.10.2010
Get full text
Year of Publication 11.10.2010
Patent
Low Temperature Plasma Process for Si/SiGe Dual Channel Fin Application
Ishii, Yohei, Lee, Yao-Jen, Wu, Wen-Fa, Maeda, Kenji, Ishimura, Hiroaki, Miura, Makoto
Published in 2019 Electron Devices Technology and Manufacturing Conference (EDTM) (01.03.2019)
Published in 2019 Electron Devices Technology and Manufacturing Conference (EDTM) (01.03.2019)
Get full text
Conference Proceeding