Resolution limit for optical lithography using polarized light illumination
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Conference Proceeding
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Post-exposure-bake simulation model with constant acid loss of chemically amplified resist
YANAGISHITA, Y, MIYATA, S, KAIMOTO, Y, OIKAWA, A, YANO, E, HANYU, I
Published in Japanese Journal of Applied Physics (01.12.1997)
Published in Japanese Journal of Applied Physics (01.12.1997)
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Conference Proceeding
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A NOVEL POLYMER FOR A 193-nm RESIST
NOZAKI, KOJI, WATANABE, KEIJI, YANO, EI, KOTACHI, AKIKO, TAKECHI, SATOSHI, HANYU, ISAMU
Published in Journal of Photopolymer Science and Technology (1996)
Published in Journal of Photopolymer Science and Technology (1996)
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Journal Article
MASCOT : Mask pattern correction tool using genetic algorithm
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Conference Proceeding
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Simple Method of Correcting Optical Proximity Effect for 0.35 µm Logic LSI Circuits
Kawamura, Eiichi, Haruki, Tamae, Manabe, Yasuo, Isamu Hanyu, Isamu Hanyu
Published in Japanese Journal of Applied Physics (01.12.1995)
Published in Japanese Journal of Applied Physics (01.12.1995)
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Journal Article
Modeling thermal effects for simulation of post exposure baking (PEB) process in positive photoresist
ASAI, S, HANYU, I, NUNOKAWA, M, ABE, M
Published in Japanese Journal of Applied Physics (01.03.1991)
Published in Japanese Journal of Applied Physics (01.03.1991)
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Journal Article
A Josephson Latch-Decoder
Hanyu, Isamu, Suzuki, Hideo, Hasuo, Shinya, Yamaoka, Toyoshi
Published in Japanese Journal of Applied Physics (01.01.1982)
Published in Japanese Journal of Applied Physics (01.01.1982)
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Journal Article
193 nm phase-shifting lithography with single layer resist for VLSIs beyond 1 G-bit DRAM
Asai, Satoru, Takechi, Satoshi, Kitamura, Yoshitaka, Tabata, Yasuko, Nozaki, Koji, Yano, Ei, Hanyu, Isamu
Published in Digest of technical papers - Symposium on VLSI Technology (01.01.1996)
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Published in Digest of technical papers - Symposium on VLSI Technology (01.01.1996)
Journal Article
Simple method of correcting optical proximity effect for 0.35 μm logic LSI circuits
KAWAMURA, E, HARUKI, T, MANABE, Y, HANYU, I
Published in Japanese journal of applied physics (01.12.1995)
Published in Japanese journal of applied physics (01.12.1995)
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Conference Proceeding
Recent advances in ultrahigh-speed HEMT LSI technology
ABE, M, MIMURA, T, KOBAYASHI, N, SUZUKI, M, KOSUGI, M, NAKAYAMA, M, ODANI, K, HANYU, I
Published in IEEE transactions on electron devices (01.10.1989)
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Published in IEEE transactions on electron devices (01.10.1989)
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