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Year of Publication 06.12.2001
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Year of Publication 16.03.2000
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Year of Publication 16.03.2000
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PLASMA ETCHING METHOD
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Year of Publication 23.04.1998
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Year of Publication 23.04.1998
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METHOD FOR REMOVING PHOTORESIST AND ETCHING RESIDUE
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Year of Publication 31.03.2011
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Year of Publication 31.03.2011
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Method for removing photoresist and etch residues
Balasubramaniam, Vaidyanathan, Hagiwara, Masaaki, Nishimura, Eiichi, Inazawa, Kouichiro
Year of Publication 30.01.2007
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Year of Publication 30.01.2007
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Method for removing photoresist and etch residues
NISHIMURA EIICHI, BALASUBRAMANIAM VAIDYANATHAN, HAGIWARA MASAAKI, INAZAWA KOUICHIRO
Year of Publication 30.01.2007
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Year of Publication 30.01.2007
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Plasma etching method and plasma etching apparatus
HAYASHI, HISATAKA, HONDA, MASANOBU, MATSUYAMA, SHOICHIRO, NAGASEKI, KAZUYA, INAZAWA, KOUICHIRO
Year of Publication 01.10.2006
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Year of Publication 01.10.2006
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PLASMA-ÄTZMETHODE
YATSUDA, KOICHI, OKAMOTO, SHIN, INAZAWA, KOUICHIRO, NISHIARA, TETSUYA
Year of Publication 24.05.2006
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Year of Publication 24.05.2006
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Method for removing photoresist and etch residues
NISHIMURA, EIICHI, HAGIWARA, MASAAKI, BALASUBRAMANIAM, VAIDYANATHAN, INAZAWA, KOUICHIRO, HATAMURA, YASUNORI
Year of Publication 21.01.2006
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Year of Publication 21.01.2006
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Method and apparatus for bilayer photoresist dry development
NISHIMURA EIICHI, HAGIHARA MASAAKI, SANSONE PHILIP, IGARASHI YOSHIKI, KIM RALPH, BALASUBRAMANIAM VAIDYANATHAN, INAZAWA KOUICHIRO, HIGUCHI KIMIHIRO
Year of Publication 16.12.2008
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Year of Publication 16.12.2008
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