METHOD OF FORMING METAL OXIDE FILM AND MICROWAVE POWER SOURCE UNIT FOR USE IN THE METHOD
KOBAYASHI, AKIRA, KURASHIMA, HIDEO, IEKI, TOSHIHIDE, INAGAKI, HAJIME, NAMIKI, TSUNEHISA, YAMADA, KOJI
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Year of Publication 13.05.2009
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Chemical vapor deposited film based on a plasma CVD method and method of forming the film
Kobayashi, Akira, Namiki, Tsunehisa, Hosono, Hiroko, Kurashima, Hideo, Inagaki, Hajime, Ieki, Toshihide
Year of Publication 10.02.2009
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Year of Publication 10.02.2009
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