Silicon oxide membrane
HAJIME INAGAKI, AKIRA KOBAYASHI, HIDEO KURASHIMA, MIWAKO TANIKAWA, TSUNEHISA NAMIKI, KOJI YAMADA, TOSHIHIDE IEKI
Year of Publication 08.02.2007
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Year of Publication 08.02.2007
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CHEMICAL VAPOR DEPOSITION FILM FORMED BY PLASMA CVD PROCESS AND METHOD FOR FORMING SAME
KOBAYASHI, AKIRA, HOSONO, HIROKO, KURASHIMA, HIDEO, INAGAKI, HAJIME, IEKI, TOSHIHIDE, NAMIKI, TSUNEHISA
Year of Publication 17.01.2007
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Year of Publication 17.01.2007
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Chemical vapor deposited film based on a plasma cvd method and method of forming the film
INAGAKI HAJIME, KURASHIMA HIDEO, IEKI TOSHIHIDE, KOBAYASHI AKIRA, HOSONO HIROKO, NAMIKI TSUNEHISA
Year of Publication 23.11.2006
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Year of Publication 23.11.2006
Patent
SILICON OXIDE MEMBRANE
KOBAYASHI, AKIRA, TANIKAWA, MIWAKO, KURASHIMA, HIDEO, IEKI, TOSHIHIDE, INAGAKI, HAJIME, NAMIKI, TSUNEHISA, YAMADA, KOJI
Year of Publication 04.10.2006
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Year of Publication 04.10.2006
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Method of forming a metal oxide film and microwave power source unit for use in the method
INAGAKI HAJIME, KURASHIMA HIDEO, IEKI TOSHIHIDE, KOBAYASHI AKIRA, NAMIKI TSUNEHISA, YAMADA KOJI
Year of Publication 29.06.2006
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Year of Publication 29.06.2006
Patent
CHEMICAL VAPOR DEPOSITION FILM FORMED BY PLASMA CVD PROCESS AND METHOD FOR FORMING SAME
KOBAYASHI, AKIRA, HOSONO, HIROKO, KURASHIMA, HIDEO, INAGAKI, HAJIME, IEKI, TOSHIHIDE, NAMIKI, TSUNEHISA
Year of Publication 01.03.2006
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Year of Publication 01.03.2006
Patent