Signal Processing Using Karhunen--Loève Expansion for Wafer Focus Measurement in Lithography
Oishi, Satoru, Ina, Hideki, Miyashita, Tomoyuki
Published in Japanese Journal of Applied Physics (01.06.2011)
Published in Japanese Journal of Applied Physics (01.06.2011)
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Journal Article
Focus and Dose Measurement Method in Volume Production
Ina, Hideki, Oishi, Satoru, Sentoku, Koichi
Published in Japanese Journal of Applied Physics (01.07.2005)
Published in Japanese Journal of Applied Physics (01.07.2005)
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Journal Article
Alignment Offset Analyzer against Wafer-Induced Shift
Ina, Hideki, Matsumoto, Takahiro, Sentoku, Koichi
Published in Japanese Journal of Applied Physics (01.06.2004)
Published in Japanese Journal of Applied Physics (01.06.2004)
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Journal Article
Alignment Mark Optimization to Reduce Tool- and Wafer-Induced Shift for XRA-1000
Ina, Hideki, Sentoku, Koichi, Matsumoto, Takahiro, Sumitani, Hiroaki, Suita, Muneyoshi
Published in Japanese Journal of Applied Physics (01.12.1999)
Published in Japanese Journal of Applied Physics (01.12.1999)
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Journal Article
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
MIYANO KOUKI, INA HIDEKI, TOYODA TAKEHIRO, ASANO KOSUKE, KOBAYASHI HIROAKI
Year of Publication 07.10.2021
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Year of Publication 07.10.2021
Patent
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
INA HIDEKI, TOYODA TAKEHIRO, ASANO KOSUKE, MIYANO KOKI, KOBAYASHI HIROAKI
Year of Publication 07.10.2021
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Year of Publication 07.10.2021
Patent