Numerical Investigations on Requirements for BARC Materials for Hyper NA Immersion Lithography
Matsuzawa, Nobuyuki, Watanabe, Yoko, Thuunakart, Boontarika, Ozawa, Ken, Yamaguchi, Yuko, Ikeda, Rikio, Kawahira, Hiroichi
Published in Journal of Photopolymer Science and Technology (01.01.2005)
Published in Journal of Photopolymer Science and Technology (01.01.2005)
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