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Year of Publication 31.08.2006
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Year of Publication 31.08.2006
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Year of Publication 04.07.2002
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Year of Publication 04.07.2002
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CHEMICAL VAPOR DEPOSITION FILM FORMED BY PLASMA CVD PROCESS AND METHOD FOR FORMING SAME
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Year of Publication 14.10.2004
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METHOD OF FORMING METAL OXIDE FILM AND MICROWAVE POWER SOURCE UNIT FOR USE IN THE METHOD
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Year of Publication 22.04.2004
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Year of Publication 22.04.2004
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SILICON OXIDE MEMBRANE
KOBAYASHI, AKIRA, TANIKAWA, MIWAKO, KURASHIMA, HIDEO, IEKI, TOSHIHIDE, INAGAKI, HAJIME, NAMIKI, TSUNEHISA, YAMADA, KOJI
Year of Publication 21.11.2002
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Year of Publication 21.11.2002
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VAPOR DEPOSITED FILM BY PLASMA CVD METHOD
KITOU, SATORU, NAKANO, RYUTA, NAKAYAMA, MEGUMI, INAGAKI, HAJIME, IEKI, TOSHIHIDE
Year of Publication 24.04.2013
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Year of Publication 24.04.2013
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Method of treatment with a microwave plasma
KOBAYASHI, AKIRA, KURASHIMA, HIDEO, IEKI, TOSHIHIDE, NAMIKI, TSUNEHISA, YAMADA, KOJI
Year of Publication 01.02.2012
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Year of Publication 01.02.2012
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Vapor deposited film by plasma CVD method
Inagaki, Hajime, Ieki, Toshihide, Kitou, Satoru, Nakano, Ryuta, Nakayama, Megumi
Year of Publication 15.03.2011
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Year of Publication 15.03.2011
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Vapor deposited film by plasma CVD method
INAGAKI HAJIME, KITOU SATORU, NAKAYAMA MEGUMI, NAKANO RYUTA, IEKI TOSHIHIDE
Year of Publication 15.03.2011
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Year of Publication 15.03.2011
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CHEMICAL VAPOR DEPOSITION FILM FORMED BY PLASMA CVD PROCESS AND METHOD FOR FORMING SAME
KOBAYASHI, AKIRA, HOSONO, HIROKO, KURASHIMA, HIDEO, INAGAKI, HAJIME, IEKI, TOSHIHIDE, NAMIKI, TSUNEHISA
Year of Publication 06.03.2013
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Year of Publication 06.03.2013
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Vapor Deposited Film by Plasma Cvd Method
INAGAKI HAJIME, KITOU SATORU, NAKAYAMA MEGUMI, NAKANO RYUTA, IEKI TOSHIHIDE
Year of Publication 11.06.2009
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Year of Publication 11.06.2009
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Method of forming a metal oxide film and microwave power source device used for the above method
INAGAKI HAJIME, KURASHIMA HIDEO, IEKI TOSHIHIDE, KOBAYASHI AKIRA, NAMIKI TSUNEHISA, YAMADA KOJI
Year of Publication 07.12.2010
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Year of Publication 07.12.2010
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VAPOR DEPOSITED FILM BY PLASMA CVD METHOD
INAGAKI HAJIME, KITOU SATORU, NAKAYAMA MEGUMI, NAKANO RYUTA, IEKI TOSHIHIDE
Year of Publication 20.11.2007
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Year of Publication 20.11.2007
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VAPOR DEPOSITED FILM BY PLASMA CVD METHOD
KITOU, SATORU, NAKANO, RYUTA, NAKAYAMA, MEGUMI, INAGAKI, HAJIME, IEKI, TOSHIHIDE
Year of Publication 07.11.2007
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Year of Publication 07.11.2007
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