Effect of In Situ Hydrogen Annealing on Dielectric Property of a Low Temperature Silicon Nitride Layer in a Bottom-Gate Nanocrystalline Silicon TFT by Catalytic CVD
Lee, Youn-Jin, Lee, Kyoung-Min, Hwang, Jae-Dam, No, Kil-Sun, Hong, Wan-Shick
Published in ECS transactions (16.04.2010)
Published in ECS transactions (16.04.2010)
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Journal Article
High-rate, low-temperature deposition of multifunctional nano-crystalline silicon nitride films
Hwang, Jae-Dam, Lee, Kyoung-Min, Keum, Ki-Su, Lee, Youn-Jin, Hong, Wan-Shick
Published in Journal of Information Display (01.09.2010)
Published in Journal of Information Display (01.09.2010)
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Journal Article
Size control of silicon nanocrystals in silicon nitride film deposited by catalytic chemical vapor deposition at a low temperature (⩽200 °C)
Lee, Kyoung-Min, Kim, Tae-Hwan, Hwang, Jae-Dam, Jang, Seunghun, Jeong, Kiyoung, Han, Moonsup, Won, Sunghwan, Sok, Junghyun, Park, Kyoungwan, Hong, Wan-Shick
Published in Scripta materialia (01.04.2009)
Published in Scripta materialia (01.04.2009)
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Journal Article
Nanocrystalline silicon films deposited with a modulated hydrogen dilution ratio by catalytic CVD at 200 °C
Kim, Tae-Hwan, Lee, Kyoung-Min, Hwang, Jae-dam, Hong, Wan-Shick
Published in Current applied physics (01.03.2009)
Published in Current applied physics (01.03.2009)
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Journal Article
Characteristics of Silicon Nanocrystals Embedded in the Amorphous-Silicon Carbide Films Deposited by Cat-CVD at Low Temperature for Optoelectronics Applications
Hwang, Jae-Dam, Lee, Kyoung-Min, Lee, Youn-Jin, Jang, Seunghun, Han, Moonsup, Won, Sunghwan, Sok, Junghyun, Park, Kyoungwan, Hong, Wan-Shick
Published in ECS transactions (01.01.2009)
Published in ECS transactions (01.01.2009)
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Journal Article
The Characterization of Bottom-gate Thin Film Transistors adapted Nanocrystalline Silicon as Active Layer by Catalytic CVD at Low Temperature
Lee, Youn-Jin, Lee, Kyoung-Min, Hwang, Jae-Dam, No, Kil-Sun, Yoon, Kap Soo, Yang, Sung Hoon, Won, Sunghwan, Sok, Junghyun, Park, Kyoungwan, Hong, Wan-Shick
Published in ECS transactions (01.01.2009)
Published in ECS transactions (01.01.2009)
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Journal Article
Nanocrystalline silicon films deposited with a modulated hydrogen dilution ratio by catalytic CVD at 200
Tae-Hwan Kim, Kyoung-Min Lee, Jae-dam Hwang, Wan-Shick Hong
Published in Current applied physics (01.03.2009)
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Published in Current applied physics (01.03.2009)
Journal Article
Excimer Laser Annealing Effects of Silicon-rich Silicon Nitride Films Prepared by Using Catalytic Chemical Vapor Deposition
Lee, Kyoung-Min, Hwang, Jae-Dam, Lee, Youn-Jin, Kim, Sun-Jae, Han, Min-Koo, Jang, Seunghun, Han, Moonsup, Won, Sunghwan, Sok, Junghyun, Park, Kyoungwan, Hong, Wan-Shick
Published in ECS transactions (25.09.2009)
Published in ECS transactions (25.09.2009)
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Journal Article
Effect of Atomic Hydrogen in SiN x Films for Gate Dielectric of Silicon-Based TFTs Fabricated at a Low-Temperature({less than or equal to} 150 °) by Cat-CVD
Keum, Ki-Su, Lee, Kyoung-Min, Hwang, Jae-Dam, No, Kil-Sun, Hong, Wan-Shick
Published in Meeting abstracts (Electrochemical Society) (01.03.2011)
Published in Meeting abstracts (Electrochemical Society) (01.03.2011)
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Journal Article
The Hysteresis Characteristics of Low Temperature ({less than or equal to} 200 °) Silicon Nanocrystals Embedded in Silicon-Rich Silicon Nitride Films
Lee, Kyoung-Min, Hwang, Jae-Dam, Keum, Ki-Su, No, Kil-Sun, Hong, Wan-Shick
Published in Meeting abstracts (Electrochemical Society) (01.03.2011)
Published in Meeting abstracts (Electrochemical Society) (01.03.2011)
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Journal Article
Structure Changes of Amorphous Silicon Carbide Films by Mixture Gas Ratio and Filament Temperature on Cat-CVD
Hwang, Jae-Dam, Lee, Kyoung-Min, Lee, Youn-Jin, Jang, Seunghun, Han, Moonsup, Hong, Wan-Shick
Published in Meeting abstracts (Electrochemical Society) (08.07.2010)
Published in Meeting abstracts (Electrochemical Society) (08.07.2010)
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Journal Article
Effect of In Situ Hydrogen Annealing on Dielectric Property of a Low Temperature Silicon Nitride Layer in a Bottom-Gate Nanocrystalline Silicon TFT by Catalytic CVD
Lee, Youn-Jin, Lee, Kyoung-Min, Hwang, Jae-Dam, No, Kil-Sun, Hong, Wan-Shick
Published in Meeting abstracts (Electrochemical Society) (05.02.2010)
Published in Meeting abstracts (Electrochemical Society) (05.02.2010)
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Journal Article
Characteristics of Silicon Nanocrystals Embedded in the Silicon Nitride Films Deposited by PE-CVD for Optoelectronics Applications
Hwang, Jae-Dam, Lee, Kyoung-Min, Keum, Ki-Su, Jang, Seunghun, Han, Moonsup, Sok, Junghyun, Park, Kyoungwan, Hong, Wan-Shick
Published in Meeting abstracts (Electrochemical Society) (08.07.2010)
Published in Meeting abstracts (Electrochemical Society) (08.07.2010)
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Journal Article
Characteristics of Low-Temperature ({less than or equal to}200 {degree sign}C) Cat-CVD Silicon Nitride Films Annealed In Situ with Atomic Hydrogen for Gate Dielectrics on Flexible Substrates
Keum, Ki-Su, Lee, Kyoung-Min, Hwang, Jae-Dam, Lee, Youn-Jin, No, Kil-Sun, Hong, Wan-Shick
Published in Meeting abstracts (Electrochemical Society) (08.07.2010)
Published in Meeting abstracts (Electrochemical Society) (08.07.2010)
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Journal Article