Study of Cu Bimetallic Corrosion in CMP Chemical Environments Using Optical Scanning and Micropattern Corrosion Screening
Yu, Kyle, Thomas, Nicole, Venkataraman, Shyam S., Pillai, Karthikeyan S., Hurd, Trace, Boggs, Karl, Chyan, Oliver
Published in ECS transactions (01.01.2011)
Published in ECS transactions (01.01.2011)
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Journal Article
웨이퍼 건조를 위한 시스템 및 방법
PACHECO ROTONDARO ANTONIO LUIS, HURD TRACE, KOSUGI HITOSHI, BASSETT DEREK
Year of Publication 22.11.2022
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Year of Publication 22.11.2022
Patent
(Invited) Wet Etching inside Advanced High Aspect Ratio Structures: Impact of Dissolved Oxygen
Sakazaki, Tetsuya, Kosugi, Hitoshi, Bassett, Derek W, Simms, Ihsan, Rotondaro, Antonio, Hurd, Trace
Published in ECS transactions (03.07.2019)
Published in ECS transactions (03.07.2019)
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Journal Article
H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrity
SCHMIDT, H. F, MEURIS, M, MERTENS, P. W, ROTONDARO, A. L. P, HEYNS, M. M, HURD, T. Q, HATCHER, Z
Published in Japanese journal of applied physics (1995)
Published in Japanese journal of applied physics (1995)
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Conference Proceeding
NON-SELECTIVE OXIDE ETCH WET CLEAN COMPOSITION AND METHOD OF USE
ZHANG PENG, COOPER EMANUEL, MINSEK DAVID, HURD TRACE QUENTIN, PETRUSKA MELISSA A, SERKE BRITTANY, SONTHALIA PRERNA
Year of Publication 12.11.2015
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Year of Publication 12.11.2015
Patent
POST-CMP FORMULATION HAVING IMPROVED BARRIER LAYER COMPATIBILITY AND CLEANING PERFORMANCE
MEDD STEVEN, JENQ SHRANE NING, LIU JUN, SUN LAISHENG, HURD TRACE QUENTIN
Year of Publication 05.12.2014
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Year of Publication 05.12.2014
Patent
NON-SELECTIVE OXIDE ETCH WET CLEAN COMPOSITION AND METHOD OF USE
ZHANG PENG, COOPER EMANUEL, MINSEK DAVID, HURD TRACE QUENTIN, PETRUSKA MELISSA A, SERKE BRITTANY, SONTHALIA PRERNA
Year of Publication 24.11.2010
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Year of Publication 24.11.2010
Patent
System and methods for wafer drying
Hurd, Trace, Rotondaro, Antonio Luis Pacheco, Bassett, Derek William, Kosugi, Hitoshi
Year of Publication 04.06.2024
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Year of Publication 04.06.2024
Patent
System and Methods for Wafer Drying
Hurd, Trace, Rotondaro, Antonio Luis Pacheco, Bassett, Derek William, Kosugi, Hitoshi
Year of Publication 23.03.2023
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Year of Publication 23.03.2023
Patent
System and methods for wafer drying
Hurd, Trace, Rotondaro, Antonio Luis Pacheco, Bassett, Derek William, Kosugi, Hitoshi
Year of Publication 29.11.2022
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Year of Publication 29.11.2022
Patent
Aqueous cleaning solution and method of protecting features on a substrate during etch residue removal
Hurd, Trace, Marumoto, Hiroshi, Nishiwaki, Yoshinori, Toshima, Takayuki
Year of Publication 24.11.2020
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Year of Publication 24.11.2020
Patent
Apparatus and method to electrostatically remove foreign matter from substrate surfaces
Simms, Ihsan, Rotondaro, Antonio Luis Pacheco, Bassett, Derek, Hurd, Trace Quentin
Year of Publication 05.07.2022
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Year of Publication 05.07.2022
Patent