SiOC CMP developed and implemented in 7nm and beyond
Haigou Huang, Taifong Chao, Ja-Hyung Han, Koli, Dinesh, Qiang Fang
Published in 2017 China Semiconductor Technology International Conference (CSTIC) (01.03.2017)
Published in 2017 China Semiconductor Technology International Conference (CSTIC) (01.03.2017)
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Conference Proceeding
The Role of Polysilicon Slurry and Its Application in 7nm CMP
Chao, Tai Fong, Penigalapati, Dinesh, Yang, JI Chul, Huang, Haigou, Koli, Dinesh R
Published in ECS transactions (26.04.2017)
Published in ECS transactions (26.04.2017)
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Journal Article
CMP: Consideration of Stop-on Selectivity in Advanced Node Semiconductor Manufacturing Technology
Tsai, Stan, Amanapu, Hari, Xie, Ruilong, Zhang, John, Chung, Kisup, Labelle, Cathy, Huang, Haigou, Han, Ja-Hyung, Koli, Dinesh R, Surisetty, Charan
Published in ECS transactions (25.04.2017)
Published in ECS transactions (25.04.2017)
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Journal Article
CMP Challenges for Advanced Technology Nodes
Zhang, John H., Huang, Haigou, Greene, Andrew M., Xie, Ruilong, Seo, Soon-Cheon, Montanini, Pietro, Tseng, Wei-Tsu, Tsai, Stan, Malley, Matthew, Fang, Qiang, Patlolla, Raghuveer, Koli, Dinesh, Guo, Dechao, Canaperi, Donald F., Surisetty, Charan, Wynne, Jean E., Kleemeier, Walter, Labelle, Cathy
Published in MRS advances (01.01.2017)
Published in MRS advances (01.01.2017)
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Journal Article